Investigation and predictive modeling of the optical behavior of chalcogenide thin film using different artificial neural network techniques

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-01-21 DOI:10.1007/s10854-025-14220-4
H. I. Lebda, H. E. Atyia, R. A. Mohamed
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Abstract

The \({\text{Te}}_{72}{\text{Ge}}_{24}{\text{As}}_{4}\) samples were recently created in our laboratory in bulk form using the traditional melt-quench method. For its optical characterization. The studied thin film samples have been created using physical vapor deposition. By selecting the 400 nm to 2500 nm spectral range of wavelength, the spectral of the experimental transmission T(λ) and reflectance R(λ) for the studied film samples have been employed to examine optical characteristics. First, we have determined the extinction coefficient (\(k\)) and refraction index (\(n\)) indices and their spectral distribution of them. Using Tauc's theory, we then computed the optical band gap \({E}_{\text{opt}}\). Urbach energy \({E}_{r}\) is determined from the linear dependence of photon energy on the absorption coefficient which was taken as an indicator to identify the disorder degree in the films. The additional variables, like the dissipation and quality factors, the dielectric constant in complex form, optical, thermal, and electrical conductivity, and volume/surface energy were measured. A comprehensive analysis and predictive modeling using various artificial neural networks (ANNs) techniques were applied to examine the optical behavior of the film samples studied. Materials made of chalcogenide are well-known for having special optical properties, making them appropriate for applications in photonics and optoelectronics. We employed multiple architectures, including Feedforward Neural Networks (FNN) and Recurrent Neural Networks (RNN), to model the extinction coefficient (\(k\)) and the refractive index (\(n\)) of these films using experimental data. The performance of each model was evaluated using metrics such as mean squared error MSE and correlation coefficients R2. The optical parameters relevant to absorbance, refractive indices, and dielectric coefficients are computed rely on the modeling results and compared with those computed based on experimental measurements. Results demonstrate that FNN and RNN effectively capture the complex relationships between the optical parameters and exhibit small error rates. FFN shows superior accuracy in prediction. That highlights the potential of ANN techniques for advancing the understanding of chalcogenide materials and their applications in modern technology.

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利用不同的人工神经网络技术研究硫族化合物薄膜的光学行为并进行预测建模
\({\text{Te}}_{72}{\text{Ge}}_{24}{\text{As}}_{4}\)样品最近在我们的实验室中以散装形式使用传统的熔融淬火方法创建。因为它的光学特性。所研究的薄膜样品是用物理气相沉积制备的。通过选取400 nm ~ 2500 nm波长的光谱范围,利用实验透射光谱T(λ)和反射率R(λ)对所研究薄膜样品的光学特性进行了考察。首先,我们确定了消光系数(\(k\))和折射率(\(n\))指数及其光谱分布。利用Tauc的理论,我们计算了光学带隙\({E}_{\text{opt}}\)。乌尔巴赫能量\({E}_{r}\)由光子能量与吸收系数的线性关系确定,吸收系数作为识别膜中无序程度的指标。测量了附加变量,如耗散和质量因子,复杂形式的介电常数,光学,热和电导率以及体积/表面能。利用各种人工神经网络(ann)技术对所研究的薄膜样品的光学行为进行了综合分析和预测建模。由硫族化物制成的材料以具有特殊的光学性质而闻名,使其适合于光子学和光电子学的应用。我们采用了前馈神经网络(FNN)和循环神经网络(RNN)等多种架构,利用实验数据对这些薄膜的消光系数(\(k\))和折射率(\(n\))进行了建模。使用均方误差MSE和相关系数R2等指标评估每个模型的性能。根据模拟结果计算出了与吸光度、折射率和介电系数相关的光学参数,并与实验测量结果进行了比较。结果表明,FNN和RNN能有效地捕捉光学参数之间的复杂关系,错误率小。FFN具有较好的预测精度。这突出了人工神经网络技术在促进对硫系材料的理解及其在现代技术中的应用方面的潜力。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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