{"title":"Volatile Resistive Switching and Short-Term Synaptic Plasticity in a Ferroelectric-Modulated SrFeOx Memristor","authors":"Wenjie Hu, Zhen Fan, Linyuan Mo, Haipeng Lin, Meixia Li, Wenjie Li, Jiali Ou, Ruiqiang Tao, Guo Tian, Minghui Qin, Min Zeng, Xubing Lu, Guofu Zhou, Xingsen Gao, Jun-Ming Liu","doi":"10.1021/acsami.4c19627","DOIUrl":null,"url":null,"abstract":"SrFeO<sub><i>x</i></sub> (SFO) offers a topotactic phase transformation between an insulating brownmillerite SrFeO<sub>2.5</sub> (BM-SFO) phase and a conductive perovskite SrFeO<sub>3</sub> (PV-SFO) phase, making it a competitive candidate for use in resistive memory and neuromorphic computing. However, most of existing SFO-based memristors are nonvolatile devices which struggle to achieve short-term synaptic plasticity (STP). To address this issue and realize STP, we propose to leverage ferroelectric polarization to effectively draw ions across the interface so that the PV-SFO conductive filaments (CFs) can be ruptured in absence of an external field. As a proof of concept, we fabricate ferroelectric Pb(Zr<sub>0.2</sub>Ti<sub>0.8</sub>)O<sub>3</sub> (PZT)/BM-SFO bilayer films with Au top electrodes and SrRuO<sub>3</sub> bottom electrodes. The device exhibits the desired volatile resistive switching behavior, with its low resistance state decaying over time. Such volatility is attributed to the positive polarization charge near the PZT/SFO interface, which can attract the oxygen ions from SFO to PZT and hence lead to the rupture of CFs. Moreover, this volatile device successfully emulates STP-related synaptic functions, including excitatory postsynaptic current, paired-pulse facilitation, learning-experience behavior, associative learning, and reservoir computing. Our study showcases an effective method for achieving volatile resistive switching and STP, which may be applied to various systems beyond SFO-based memristors.","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"20 1","pages":""},"PeriodicalIF":8.3000,"publicationDate":"2025-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1021/acsami.4c19627","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
SrFeOx (SFO) offers a topotactic phase transformation between an insulating brownmillerite SrFeO2.5 (BM-SFO) phase and a conductive perovskite SrFeO3 (PV-SFO) phase, making it a competitive candidate for use in resistive memory and neuromorphic computing. However, most of existing SFO-based memristors are nonvolatile devices which struggle to achieve short-term synaptic plasticity (STP). To address this issue and realize STP, we propose to leverage ferroelectric polarization to effectively draw ions across the interface so that the PV-SFO conductive filaments (CFs) can be ruptured in absence of an external field. As a proof of concept, we fabricate ferroelectric Pb(Zr0.2Ti0.8)O3 (PZT)/BM-SFO bilayer films with Au top electrodes and SrRuO3 bottom electrodes. The device exhibits the desired volatile resistive switching behavior, with its low resistance state decaying over time. Such volatility is attributed to the positive polarization charge near the PZT/SFO interface, which can attract the oxygen ions from SFO to PZT and hence lead to the rupture of CFs. Moreover, this volatile device successfully emulates STP-related synaptic functions, including excitatory postsynaptic current, paired-pulse facilitation, learning-experience behavior, associative learning, and reservoir computing. Our study showcases an effective method for achieving volatile resistive switching and STP, which may be applied to various systems beyond SFO-based memristors.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.