{"title":"Effect of Si addition on polarity inversion in scandium aluminum nitride piezoelectric thin films","authors":"Sri Ayu Anggraini, Masato Uehara, Kenji Hirata, Taisei Motomura, Hiroshi Yamada, Morito Akiyama","doi":"10.1016/j.scriptamat.2024.116523","DOIUrl":null,"url":null,"abstract":"<div><div>Scandium aluminum nitride (Sc<sub>x</sub>Al<sub>1-x</sub>N) has been championed as the future material and controlling its polarity is anticipated to bring improvement to the performance of broad range electronic devices, including radio frequency (RF) filter. In this study, the polarity of Sc<sub>x</sub>Al<sub>1-x</sub>N thin films fabricated via sputtering was successfully inversed from metal (M)-polar to nitrogen (N)-polar by addition of silicon (Si) in the range of 2.5–20.0 at.%. Addition of approximately 10 at % Si into Sc<sub>x</sub>Al<sub>1-x</sub>N brought the optimum piezoelectric coefficient <em>d</em><sub>33</sub>, particularly for <em>x</em> = 0.1 and 0.2 where the resulted <em>d</em><sub>33</sub> was found to be similar with that without Si addition. However, addition of Si could not inverse the polarity of Sc<sub>0.4</sub>Al<sub>0.6</sub>N, suggesting that the concentration of both Si and scandium (Sc) governed the resulting polarity. Effect of Si addition into ScAlN on changes in polarity, crystal structure as well as plausible mechanism were further discussed herein.</div></div>","PeriodicalId":423,"journal":{"name":"Scripta Materialia","volume":"258 ","pages":"Article 116523"},"PeriodicalIF":5.3000,"publicationDate":"2024-12-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Scripta Materialia","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1359646224005566","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Scandium aluminum nitride (ScxAl1-xN) has been championed as the future material and controlling its polarity is anticipated to bring improvement to the performance of broad range electronic devices, including radio frequency (RF) filter. In this study, the polarity of ScxAl1-xN thin films fabricated via sputtering was successfully inversed from metal (M)-polar to nitrogen (N)-polar by addition of silicon (Si) in the range of 2.5–20.0 at.%. Addition of approximately 10 at % Si into ScxAl1-xN brought the optimum piezoelectric coefficient d33, particularly for x = 0.1 and 0.2 where the resulted d33 was found to be similar with that without Si addition. However, addition of Si could not inverse the polarity of Sc0.4Al0.6N, suggesting that the concentration of both Si and scandium (Sc) governed the resulting polarity. Effect of Si addition into ScAlN on changes in polarity, crystal structure as well as plausible mechanism were further discussed herein.
期刊介绍:
Scripta Materialia is a LETTERS journal of Acta Materialia, providing a forum for the rapid publication of short communications on the relationship between the structure and the properties of inorganic materials. The emphasis is on originality rather than incremental research. Short reports on the development of materials with novel or substantially improved properties are also welcomed. Emphasis is on either the functional or mechanical behavior of metals, ceramics and semiconductors at all length scales.