Stabilize the oxygen vacancies in CuFe2O4 via altering local electronic structure by Co doping: Critical role of Co doping and photo-Fenton degradation of chloramphenicol

IF 6.3 3区 工程技术 Q1 ENGINEERING, CHEMICAL Journal of the Taiwan Institute of Chemical Engineers Pub Date : 2025-04-01 Epub Date: 2025-01-09 DOI:10.1016/j.jtice.2024.105936
S. Sudheer Khan , V. Vinotha Sre , M. Swedha , Asad Syed , Abdallah M. Elgorban , Islem Abid , Ling Shing Wong
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Abstract

Background

The indiscriminate use of chloramphenicol (CHLORO) leads to its release into surface and groundwaters which causes the emergence of antibiotic-resistant bacteria that could pose a detrimental threat to human health and aquatic life.

Methods

Herein, we investigated the manipulation of lattice strain in CuFe2O4 (CFO) through cobalt (Co) doping and oxygen vacancies (OV) by a simple co-precipitation method for improved photocatalytic performance. The critical role of Co doping and photo-Fenton degradation of chloramphenicol CHLORO under visible light irradiation was investigated.

Findings

The study highlighted the enhanced photocatalytic degradation of CHLORO by Cu0.6Co0.4Fe2O4 nanocatalyst (Co-CFO-0.4 NCs) and it reached 99.8 % and the photocatalyst was stable even after 6th cycle. Here, the analysis of the CFO material indicates that Co doping creates unique compressive forces, whereas OV leads to tensile forces, both contributing to the enhancement of localized lattice strain. The Co-CFO-0.4 NCs exhibited 1.51 times enhanced photocatalytic activity than pristine compounds for CHLORO degradation. The predominant generation of hydroxyl radical (•OH) by Co-CFO-0.4 NCs along with contributions from hydrogen peroxide (H2O2), significantly increases the catalytic activity of the material, leading to complete degradation of CHLORO. The radical's formation was validated by using electron spin resonance (ESR) and scavenging studies. Additionally, the degradation pathway of CHLORO by Co-CFO-0.4 NCs were proposed and the possible toxicity associated with the intermediated were predicted. The study underscores the importance of engineering Ov and surface doping to enhance the performance of photocatalysts, thereby contributing to wastewater remediation.

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通过Co掺杂改变CuFe2O4的局部电子结构来稳定氧空位:Co掺杂和光- fenton降解氯霉素的关键作用
背景氯霉素的滥用导致其释放到地表水和地下水中,从而导致耐抗生素细菌的出现,可能对人类健康和水生生物构成有害威胁。方法采用简单共沉淀法,通过钴(Co)掺杂和氧空位(OV)修饰CuFe2O4 (CFO)的晶格应变,以提高CuFe2O4的光催化性能。研究了可见光下Co掺杂和光fenton降解氯霉素的关键作用。结果Cu0.6Co0.4Fe2O4纳米催化剂(Co-CFO-0.4 NCs)对氯离子的光催化降解率达到99.8%,6次循环后仍保持稳定。这里,对CFO材料的分析表明,Co掺杂产生了独特的压缩力,而OV则产生了拉伸力,两者都有助于增强局部晶格应变。Co-CFO-0.4 NCs的光催化活性比原始化合物提高了1.51倍。Co-CFO-0.4 NCs生成的羟基自由基(•OH)和过氧化氢(H2O2)的贡献显著提高了材料的催化活性,导致氯的完全降解。通过电子自旋共振(ESR)和清除研究证实了自由基的形成。此外,还提出了Co-CFO-0.4 NCs对氯的降解途径,并预测了中间体可能产生的毒性。该研究强调了工程Ov和表面掺杂对提高光催化剂性能的重要性,从而有助于废水的修复。
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来源期刊
CiteScore
9.10
自引率
14.00%
发文量
362
审稿时长
35 days
期刊介绍: Journal of the Taiwan Institute of Chemical Engineers (formerly known as Journal of the Chinese Institute of Chemical Engineers) publishes original works, from fundamental principles to practical applications, in the broad field of chemical engineering with special focus on three aspects: Chemical and Biomolecular Science and Technology, Energy and Environmental Science and Technology, and Materials Science and Technology. Authors should choose for their manuscript an appropriate aspect section and a few related classifications when submitting to the journal online.
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