Effect of plasma process parameters on the wear behavior of High-Power Pulsed Magnetron Sputtering deposited Aluminum Titanium Nitride coatings

IF 2.9 Q1 MATERIALS SCIENCE, CERAMICS Open Ceramics Pub Date : 2025-01-28 DOI:10.1016/j.oceram.2025.100746

Muhammad Naveed PhD , Awais Qadir PhD

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Abstract

High Power Pulsed Magnetron Sputtering (HPPMS) has emerged as a promising physical vapor deposition (PVD) technique for depositing hard coatings on cutting tools. Among these coatings, Aluminum Titanium Nitride (AlTiN) is widely recognized for its excellent mechanical and thermal properties, making it a popular choice for industrial cutting applications. Despite its growing adoption by coating solution providers, there remains a limited understanding of the influence of key HPPMS process parameters on the development of high-performance AlTiN coatings. This study investigates the effects of two critical process parameters—substrate bias and target frequency—on the deposition of AlTiN coatings. The wear behavior of the coated tools was assessed through turning tests, evaluating their performance under industrially relevant conditions. Additionally, the challenges of depositing coatings on tools with complex geometries were addressed. The findings provide valuable insights into the optimization of HPPMS process parameters, contributing to the development of advanced coatings with enhanced wear resistance and improved performance in cutting applications.

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