A Fast flatness deviation evaluation algorithm for point cloud data

IF 3.7 2区 工程技术 Q2 ENGINEERING, MANUFACTURING Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology Pub Date : 2025-03-01 Epub Date: 2024-12-03 DOI:10.1016/j.precisioneng.2024.11.013
Fan Liu , Yanlong Cao , Tukun Li , Jiangxin Yang , Junnan Zhi , Jia Luo , Yuanping Xu , Xiangqian Jiang
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Abstract

This paper proposes and develops a novel method, namely the Partially Iterative Algorithm (PIA), for high-speed assessment of flatness deviation for point cloud data, which is typically measured data obtained by advanced instruments for precision manufacturing, such as optical scanners and industrial computed tomography. Firstly, an enhanced flatness deviation model is established based on the minimum zone principle, which is strictly adhered to the latest ISO definition. Secondly, the proposed method is detailed, including the Dynamic Point Set (DPS), the update scheme, and the terminal condition. Thirdly, comparisons are conducted with typical methods for flatness deviation assessment, along with a practicability test via the simulated dataset and measuring dataset. The results show that the proposed method can accurately and rapidly assess flatness deviation on point cloud data with massive measuring points.
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一种快速的点云数据平面度偏差评估算法
本文提出并发展了一种新的方法,即部分迭代算法(PIA),用于点云数据的平面度偏差高速评估,点云数据通常是由光学扫描仪和工业计算机断层扫描等先进精密制造仪器获得的测量数据。首先,基于最小区域原理,严格遵循ISO最新定义,建立了平面度偏差增强模型;其次,详细介绍了该方法,包括动态点集(DPS)、更新方案和终端条件。第三,与典型板形偏差评估方法进行比较,并通过模拟数据集和实测数据集进行实用性测试。结果表明,该方法能够在大量测点的点云数据上准确、快速地评估平面度偏差。
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来源期刊
CiteScore
7.40
自引率
5.60%
发文量
177
审稿时长
46 days
期刊介绍: Precision Engineering - Journal of the International Societies for Precision Engineering and Nanotechnology is devoted to the multidisciplinary study and practice of high accuracy engineering, metrology, and manufacturing. The journal takes an integrated approach to all subjects related to research, design, manufacture, performance validation, and application of high precision machines, instruments, and components, including fundamental and applied research and development in manufacturing processes, fabrication technology, and advanced measurement science. The scope includes precision-engineered systems and supporting metrology over the full range of length scales, from atom-based nanotechnology and advanced lithographic technology to large-scale systems, including optical and radio telescopes and macrometrology.
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