Anisotropic growth mechanism of epitaxial graphene on 4H-SiC

IF 6.6 2区 材料科学 Q2 CHEMISTRY, PHYSICAL Applied Surface Science Pub Date : 2025-05-01 Epub Date: 2025-02-08 DOI:10.1016/j.apsusc.2025.162596
Jiadong Chen, Cunzhi Sun, Dingqu Lin, Xiaping Chen, Yuning Zhang, Feng Zhang, Deyi Fu, Rong Zhang
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Abstract

The growth process of SiC epitaxial graphene at low pressure has been investigated systematically. Transition from buffer layer to full monolayer graphene undergoes several stages including graphene nanoribbon nucleation, directional growth and full merging. The morphologies and structures of the graphene at different stages are characterized by scanning electron microscopy, atomic force microscopy and Raman spectroscopy. The anisotropic growth mechanism of epitaxial graphene has been revealed by statistical analysis of the shapes and sizes of graphene nanoribbons (width ranges from 40 to 300 nm with a maximum length L of ∼ 1.08 μm). It is found that silicon sublimation rate plays a critical role in determining the anisotropic growth of nanoribbons, which is further confirmed by the evolution of the characterized sizes of nanoribbons at different growth stages.

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外延石墨烯在4H-SiC上的各向异性生长机理
系统地研究了SiC外延石墨烯在低压下的生长过程。从缓冲层到全单层石墨烯的过渡经历了石墨烯纳米带成核、定向生长和完全融合的几个阶段。利用扫描电子显微镜、原子力显微镜和拉曼光谱对石墨烯在不同阶段的形貌和结构进行了表征。外延石墨烯的各向异性生长机制已通过对石墨烯纳米带的形状和尺寸的统计分析(宽度范围为40至300 nm,最大长度为 ~ 1.08 μm)揭示。研究发现,硅升华速率对纳米带的各向异性生长起着至关重要的作用,不同生长阶段纳米带特征尺寸的演变进一步证实了这一点。
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来源期刊
Applied Surface Science
Applied Surface Science 工程技术-材料科学:膜
CiteScore
12.50
自引率
7.50%
发文量
3393
审稿时长
67 days
期刊介绍: Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.
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