Anisotropic growth mechanism of epitaxial graphene on 4H-SiC

IF 6.3 2区 材料科学 Q2 CHEMISTRY, PHYSICAL Applied Surface Science Pub Date : 2025-02-08 DOI:10.1016/j.apsusc.2025.162596
Jiadong Chen, Cunzhi Sun, Dingqu Lin, Xiaping Chen, Yuning Zhang, Feng Zhang, Deyi Fu, Rong Zhang
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Abstract

The growth process of SiC epitaxial graphene at low pressure has been investigated systematically. Transition from buffer layer to full monolayer graphene undergoes several stages including graphene nanoribbon nucleation, directional growth and full merging. The morphologies and structures of the graphene at different stages are characterized by scanning electron microscopy, atomic force microscopy and Raman spectroscopy. The anisotropic growth mechanism of epitaxial graphene has been revealed by statistical analysis of the shapes and sizes of graphene nanoribbons (width ranges from 40 to 300 nm with a maximum length L of ∼ 1.08 μm). It is found that silicon sublimation rate plays a critical role in determining the anisotropic growth of nanoribbons, which is further confirmed by the evolution of the characterized sizes of nanoribbons at different growth stages.

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来源期刊
Applied Surface Science
Applied Surface Science 工程技术-材料科学:膜
CiteScore
12.50
自引率
7.50%
发文量
3393
审稿时长
67 days
期刊介绍: Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.
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