Piecewise system identification and trajectory acceleration reallocating for diamond turning of microlens arrays

Zhiyue Wang , Zhenhua Jiang , Hao Wu , Yangqin Yu , Limin Zhu , Xinquan Zhang
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引用次数: 0

Abstract

The use of microlens arrays (MLAs) manufactured through slow tool servo (STS) machining is becoming increasingly common in the field of complex surface optics. However, the current STS technique presents a significant challenge in balancing machining efficiency and surface profile accuracy, mainly due to the rapid variations in the spatial frequency of the microlenses. To address this challenge, this study proposes a piecewise system identification method along with trajectory acceleration reallocating. Specifically, the proposed method models the machine lathe Z-axis as a dynamic system piecewise, segmented by different trajectory acceleration intervals, to accurately approximate the nonlinear dynamic response of Z-axis. Tracking error prediction and trajectory acceleration reallocating are developed based on the piecewise system identification. To validate the proposed approach, diamond turning experiments were conducted on an ultraprecision machine lathe. The proposed approach significantly enhances the surface form accuracy while marginally improving the machining efficiency.
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来源期刊
CiteScore
7.40
自引率
5.60%
发文量
177
审稿时长
46 days
期刊介绍: Precision Engineering - Journal of the International Societies for Precision Engineering and Nanotechnology is devoted to the multidisciplinary study and practice of high accuracy engineering, metrology, and manufacturing. The journal takes an integrated approach to all subjects related to research, design, manufacture, performance validation, and application of high precision machines, instruments, and components, including fundamental and applied research and development in manufacturing processes, fabrication technology, and advanced measurement science. The scope includes precision-engineered systems and supporting metrology over the full range of length scales, from atom-based nanotechnology and advanced lithographic technology to large-scale systems, including optical and radio telescopes and macrometrology.
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