Stacking-dependent tunable valley splitting in Janus SMoSiN2-based van der Waals heterostructure

IF 3.6 2区物理与天体物理 Q2 PHYSICS, APPLIED Applied Physics Letters Pub Date : 2025-02-12 DOI:10.1063/5.0250449

Hui Zeng, Weijie Zhang, Chengyu Qiu, Jun Zhao, Dazhi Ding

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Abstract

Using the first principles calculation, we explore the modulation of valley-related properties of two-dimensional (2D) Janus SMoSiN2 monolayer by constructing van der Waals (vdW) heterostructure with the ferromagnet CrCl3 monolayer. The monolayered SMoSiN2 possesses excellent stability and direct bandgap at the K/K′ valley, making it a promising candidate for valleytronic semiconductor. The ferromagnet CrCl3 substrate induces a sizable valley splitting via proximity coupling. The valley-contrasting property of the top-stacking is significantly tunable by both in-plane sliding and vertical strain engineering, leading to extraordinary tunability of valley splitting in the range 1.6–9.4 meV. In contrast, the valley-contrasting property of the bottom-stacking is comparably robust due to the screen effect originating from the outmost N sublayer to reduce the proximity interaction. Our investigation reveals that the stacking order is a degree of freedom to manipulate the valley-related properties of various vdW heterostructures, facilitating the achievement of versatile valley-contrasting properties.

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基于Janus smosin2的范德华异质结构中堆叠依赖的可调谐谷分裂

利用第一性原理计算，我们利用铁磁体CrCl3单层构建van der Waals （vdW）异质结构，探索了二维（2D） Janus SMoSiN2单层的谷相关性质调制。单层SMoSiN2具有优异的稳定性和K/K谷的直接带隙，是谷电子半导体的理想候选材料。铁磁体CrCl3衬底通过近距离耦合诱导了相当大的谷分裂。通过平面内滑动和垂直应变工程可以显著调节顶叠加的谷对比特性，从而在1.6-9.4 meV范围内实现谷分裂的可调性。相比之下，由于最外层N子层产生的屏蔽效应减少了邻近相互作用，底部堆叠的谷对比特性相对较强。我们的研究表明，堆叠顺序是操纵各种vdW异质结构的谷相关特性的自由度，有助于实现多种谷对比特性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.