Optical Memory in a MoSe2/Clinochlore Device

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-02-13 DOI:10.1021/acsami.4c19337
Alessandra Ames, Frederico B. Sousa, Gabriel A. D. Souza, Raphaela de Oliveira, Igor R. F. Silva, Gabriel L. Rodrigues, Kenji Watanabe, Takashi Taniguchi, Gilmar E. Marques, Ingrid D. Barcelos, Alisson R. Cadore, Victor Lopez-Richard, Marcio D. Teodoro
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Abstract

Two-dimensional heterostructures have been crucial in advancing optoelectronic devices utilizing van der Waals materials. Semiconducting transition-metal dichalcogenide monolayers, known for their unique optical properties, offer extensive possibilities for light-emitting devices. Recently, a memory-driven optical device, termed a Mem-emitter, was proposed by using these monolayers atop dielectric substrates. The successful realization of such devices heavily depends on the selection of the optimal substrate. Here, we report a pronounced memory effect in a MoSe2/clinochlore device, evidenced by an electric hysteresis in the intensity and energy of MoSe2 monolayer emissions. This demonstrates both population- and transition-rate-driven Mem-emitter abilities. Our theoretical approach correlates these memory effects with internal state variables of the substrate, emphasizing that a clinochlore-layered structure is crucial for a robust and rich memory response. This work introduces a novel two-dimensional device with promising applications in memory functionalities, highlighting the importance of alternate insulators in the fabrication of van der Waals heterostructures.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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