Wenyan Zhao , Peng Wu , Rui Xu , Zhuangzhi Li , Huanxin Yang , Chunhui Zhu , Jianqi Li
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引用次数: 0
Abstract
The reduction of radiation damage represents a long-term objective for electron microscopists, particularly those engaged in the study of biological and organic matter. Recently, electron pulses in ultrafast transmission electron microscopy have been demonstrated to serve as a damage mitigation technique for radiation-sensitive materials. Nevertheless, the underlying mechanism of the mitigation effects remains unclear. In this study, we investigate the radiation damage of graphene induced by pulsed electrons using molecular dynamics simulations within the framework of binary elastic collisions. For electron irradiation at 200 keV, it was found that the pulsed electron beam corresponds to a larger threshold angle (1.4 rad) than that for a random beam (1.0 rad). This is because two electrons can be prevented from briefly interacting with the same or a neighboring atom by the use of well-controlled electron pulses. While such a mitigation of radiation damage is only apparent near the threshold angle, and there are likely other reduction mechanisms, our results provide insight into the mitigated radiation damage of electron pulses.
期刊介绍:
Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.