Pub Date : 2025-12-11DOI: 10.1016/j.micron.2025.103982
Douglas G Ivey, Peter Schamuhn Kirk, Tailin Ren, Junfang Lu
LePera's etching combined with optical microscopy is an effective way to distinguish various microstructures that can form in microalloyed steels, especially within the heat affected zone (HAZ) of steels that have been welded. Ferritic and bainitic constituents tend to be tinted by the etchant and show up as various shades of tan, while martensite-austenite (M-A) regions are not tinted and exhibit a white color or bright contrast. This paper reveals that LePera's etchant also provides a similar contrast effect, as that for M-A, for any cementite particles in the microstructure. In addition, it is shown that heat tinting of the steel, which is a common imaging aid after fracture toughness testing (including the crack tip opening displacement (CTOD) method), can alter the steel microstructure. These effects can be important when trying to correlate microstructure with mechanical properties.
{"title":"Analysis of LePera's etching of the heat affected zone of a microalloyed steel.","authors":"Douglas G Ivey, Peter Schamuhn Kirk, Tailin Ren, Junfang Lu","doi":"10.1016/j.micron.2025.103982","DOIUrl":"https://doi.org/10.1016/j.micron.2025.103982","url":null,"abstract":"<p><p>LePera's etching combined with optical microscopy is an effective way to distinguish various microstructures that can form in microalloyed steels, especially within the heat affected zone (HAZ) of steels that have been welded. Ferritic and bainitic constituents tend to be tinted by the etchant and show up as various shades of tan, while martensite-austenite (M-A) regions are not tinted and exhibit a white color or bright contrast. This paper reveals that LePera's etchant also provides a similar contrast effect, as that for M-A, for any cementite particles in the microstructure. In addition, it is shown that heat tinting of the steel, which is a common imaging aid after fracture toughness testing (including the crack tip opening displacement (CTOD) method), can alter the steel microstructure. These effects can be important when trying to correlate microstructure with mechanical properties.</p>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"202 ","pages":"103982"},"PeriodicalIF":2.2,"publicationDate":"2025-12-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145775051","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-08DOI: 10.1016/j.micron.2025.103981
Vitalijs Borisovs , Mario Bossi , Guido Cavaletti
The endoplasmic reticulum (ER) is a crucial neuronal organelle involved in protein synthesis, calcium homeostasis, and metabolic support, essential for neuronal function and plasticity. Understanding its three-dimensional (3D) architecture is key to elucidating functional organization. Using SBF-SEM and AI-assisted segmentation, we established a quantitative framework to characterize ER and mitochondrial scaling within 35 peripheral nervous system (PNS) myelinated axons. Analysis of individual organelle morphometrics revealed a strong power-law relationship between surface area and volume for both mitochondria (R2 = 0.949) and ER (R2 = 0.949). The resulting exponents were super-isometric (kMito = 0.85, kER = 0.73), suggesting structural plasticity that prioritizes membrane surface expansion. A key finding was the distinction between size and number regulation: mitochondrial and ER volumes were negligibly correlated (r ≈ 0.03), implying independent size regulation. However, organelle abundance (counts) showed a strong positive correlation (r = 0.79), maintaining an extremely low Bonferroni-adjusted Q value (8.1 ×10−9), suggesting coordinated control of organelle number in response to axonal size. Axonal populations were heterogeneous, with larger axons consistently containing more ER elements (r = 0.59) and mitochondria (r = 0.69). Furthermore, a low correlation of axon length with organelle content supports the idea that regulation is primarily a local phenomenon tied to cross-sectional size. These findings provide a quantitative basis for understanding how ER and mitochondria structurally adapt to axonal size, laying the groundwork for future research into how these scaling relationships influence neuronal metabolic health and contribute to neurological disease.
{"title":"Morphometric analysis of axonal ultrastructure: Coordinated scaling of organelles and myelin","authors":"Vitalijs Borisovs , Mario Bossi , Guido Cavaletti","doi":"10.1016/j.micron.2025.103981","DOIUrl":"10.1016/j.micron.2025.103981","url":null,"abstract":"<div><div>The endoplasmic reticulum (ER) is a crucial neuronal organelle involved in protein synthesis, calcium homeostasis, and metabolic support, essential for neuronal function and plasticity. Understanding its three-dimensional (3D) architecture is key to elucidating functional organization. Using SBF-SEM and AI-assisted segmentation, we established a quantitative framework to characterize ER and mitochondrial scaling within 35 peripheral nervous system (PNS) myelinated axons. Analysis of individual organelle morphometrics revealed a strong power-law relationship between surface area and volume for both mitochondria (R<sup>2</sup> = 0.949) and ER (R<sup>2</sup> = 0.949). The resulting exponents were super-isometric (k<sub>Mito</sub> = 0.85, k<sub>ER</sub> = 0.73), suggesting structural plasticity that prioritizes membrane surface expansion. A key finding was the distinction between size and number regulation: mitochondrial and ER volumes were negligibly correlated (r ≈ 0.03), implying independent size regulation. However, organelle abundance (counts) showed a strong positive correlation (r = 0.79), maintaining an extremely low Bonferroni-adjusted Q value (8.1 ×10<sup>−9</sup>), suggesting coordinated control of organelle number in response to axonal size. Axonal populations were heterogeneous, with larger axons consistently containing more ER elements (r = 0.59) and mitochondria (r = 0.69). Furthermore, a low correlation of axon length with organelle content supports the idea that regulation is primarily a local phenomenon tied to cross-sectional size. These findings provide a quantitative basis for understanding how ER and mitochondria structurally adapt to axonal size, laying the groundwork for future research into how these scaling relationships influence neuronal metabolic health and contribute to neurological disease.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"202 ","pages":"Article 103981"},"PeriodicalIF":2.2,"publicationDate":"2025-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145743331","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-05DOI: 10.1016/j.micron.2025.103980
J. Lautru, R. Podor
An interface that enables automatic image acquisition during high-temperature experiments in an environmental SEM is developed. It is optimized to work on multiple regions of interest at multiple magnifications, performing image focusing (focus and astigmatism) and automatic re-centering of regions of interest. Its operation has been validated by monitoring two regions of interest of a nickel-based superalloy undergoing oxidation at 950 °C at different magnifications. Recording series of images at different magnifications on different regions of interest makes it possible to qualify the behavior of different areas of the sample in a single operation and/or to validate the reproducibility of the observations.
{"title":"Development and validation of an interface for automated image acquisition during high-temperature environmental scanning electron microscopy experiments","authors":"J. Lautru, R. Podor","doi":"10.1016/j.micron.2025.103980","DOIUrl":"10.1016/j.micron.2025.103980","url":null,"abstract":"<div><div>An interface that enables automatic image acquisition during high-temperature experiments in an environmental SEM is developed. It is optimized to work on multiple regions of interest at multiple magnifications, performing image focusing (focus and astigmatism) and automatic re-centering of regions of interest. Its operation has been validated by monitoring two regions of interest of a nickel-based superalloy undergoing oxidation at 950 °C at different magnifications. Recording series of images at different magnifications on different regions of interest makes it possible to qualify the behavior of different areas of the sample in a single operation and/or to validate the reproducibility of the observations.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"202 ","pages":"Article 103980"},"PeriodicalIF":2.2,"publicationDate":"2025-12-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145701410","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-04DOI: 10.1016/j.micron.2025.103977
Liting Zhang , Qiwei Shi , Dominique Loisnard , Maxime Mollens , Haowei Wang , Stéphane Roux
The precise knowledge of the projection center (PC) coordinates is vital for diffraction techniques, especially for electron backscatter diffraction (EBSD) and transmission Kikuchi diffraction (TKD). Numerous techniques have been proposed for PC calibration, involving both hardware maneuver and algorithm developments. Hardware calibration is straightforward 1, while software calibration generally displays small uncertainties yet possible biases. A novel method is proposed herein for PC calibration, associating a moving screen 1 image correlation, thus combining the strengths of both techniques. Multiple sets of diffraction patterns of the same sample area are acquired at different positions of the detector along its track. Exploiting the geometrical relationship between them through a dedicated integrated digital image correlation framework (IDIC-M) that also associates a simulated master pattern, the PC coordinates are obtained. A unique crystal orientation and varying PC values are sought relating the different diffraction patterns to fully benefit from their consistency. This hybrid method improves the precision of PC calibration by 74.0% and 21.8% as compared to pure (hardware) moving-screen method and (software) image correlation method, respectively. Besides, the present work further validates the gradient-based version of pattern correlation, free of perceivable systematic errors, and hence deemed efficient and reliable in EBSD practices.
{"title":"A combined hardware and software method for the projection center calibration of the diffraction pattern","authors":"Liting Zhang , Qiwei Shi , Dominique Loisnard , Maxime Mollens , Haowei Wang , Stéphane Roux","doi":"10.1016/j.micron.2025.103977","DOIUrl":"10.1016/j.micron.2025.103977","url":null,"abstract":"<div><div>The precise knowledge of the projection center (PC) coordinates is vital for diffraction techniques, especially for electron backscatter diffraction (EBSD) and transmission Kikuchi diffraction (TKD). Numerous techniques have been proposed for PC calibration, involving both hardware maneuver and algorithm developments. Hardware calibration is straightforward 1, while software calibration generally displays small uncertainties yet possible biases. A novel method is proposed herein for PC calibration, associating a moving screen 1 image correlation, thus combining the strengths of both techniques. Multiple sets of diffraction patterns of the same sample area are acquired at different positions of the detector along its track. Exploiting the geometrical relationship between them through a dedicated integrated digital image correlation framework (IDIC-M) that also associates a simulated master pattern, the PC coordinates are obtained. A unique crystal orientation and varying PC values are sought relating the different diffraction patterns to fully benefit from their consistency. This hybrid method improves the precision of PC calibration by 74.0% and 21.8% as compared to pure (hardware) moving-screen method and (software) image correlation method, respectively. Besides, the present work further validates the gradient-based version of pattern correlation, free of perceivable systematic errors, and hence deemed efficient and reliable in EBSD practices.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"202 ","pages":"Article 103977"},"PeriodicalIF":2.2,"publicationDate":"2025-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145687513","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-04DOI: 10.1016/j.micron.2025.103979
Quan Yuan, Jianqiang Qian, Yingzi Li, Minghao Wang, Rui Lin, Yifan Hu, Duo Feng, Peng Cheng, Yanan Chen, Haowei Sun
Multifrequency electrostatic force microscopy (MF-EFM) is a critical tool for the electrical characterization of nanomaterial surfaces, and the quality is closely related to parameters. Molecular simulations have successfully explained the motion process in bimodal AFM. However, additional considerations are required for implementing electrostatic interactions in molecular simulations for MF-EFM. We use COMSOL to model the tip-sample system in MF-EFM, derive the fitting formula for the electrostatic forces between tip and sample, and applied it in LAMMPS. The tip response amplitude variations obtained by simulations are analyzed, and the effect of different parameters on the amplitudes of the two modes is examined. This approach successfully explained the scan process of MF-EFM, and the results are validated by experiments. We provide a reliable method for simulating atomic-scale vibration responses during MF-EFM scan.
{"title":"Molecular dynamic simulation of multi-frequency electrostatic force microscopy","authors":"Quan Yuan, Jianqiang Qian, Yingzi Li, Minghao Wang, Rui Lin, Yifan Hu, Duo Feng, Peng Cheng, Yanan Chen, Haowei Sun","doi":"10.1016/j.micron.2025.103979","DOIUrl":"10.1016/j.micron.2025.103979","url":null,"abstract":"<div><div>Multifrequency electrostatic force microscopy (MF-EFM) is a critical tool for the electrical characterization of nanomaterial surfaces, and the quality is closely related to parameters. Molecular simulations have successfully explained the motion process in bimodal AFM. However, additional considerations are required for implementing electrostatic interactions in molecular simulations for MF-EFM. We use COMSOL to model the tip-sample system in MF-EFM, derive the fitting formula for the electrostatic forces between tip and sample, and applied it in LAMMPS. The tip response amplitude variations obtained by simulations are analyzed, and the effect of different parameters on the amplitudes of the two modes is examined. This approach successfully explained the scan process of MF-EFM, and the results are validated by experiments. We provide a reliable method for simulating atomic-scale vibration responses during MF-EFM scan.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"202 ","pages":"Article 103979"},"PeriodicalIF":2.2,"publicationDate":"2025-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145692857","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-11-30DOI: 10.1016/j.micron.2025.103978
Asia Matatyaho Ya'akobi, Irina Davidovich, Yeshayahu Talmon
Scanning electron microscopy (SEM) is a widely used technique in science and engineering, traditionally performed at electron beam acceleration voltages (BAVs) above 5 kV. However, progress in field emission guns and SEM technology have made low-voltage SEM imaging more available. Low-voltage SEM offers significant advantages, such as high-resolution imaging and the imaging of non-coated insulating specimens without charging artifacts. Nevertheless, there is limited research on electron-specimen interactions and the influence of SEM operational parameters on the obtained micrograph at the low-voltage range. This study focuses on low-voltage SEM imaging, below 2 kV, using a high-resolution in-the-lens detector. We investigated the effects of BAV and working distance (WD) on micrograph contrast and resolution. Carbon nanotubes and boron nitride nanotubes, two very important advanced materials, were used as model specimens of conductive and non-conductive materials, respectively, and silicon wafers and glass slides were used as model conductive and non-conductive substrates. We found that optimal imaging conditions differ with specimen properties; optimal results were typically obtained at low BAV (0.8–1.2 kV) and short WD (below 3 mm). Additionally, we show that substrate conductivity affects micrograph quality. Counterintuitively, insulating substrates provide better results in some cases. These findings emphasize the importance of optimizing SEM imaging parameters, and choosing the substrate according to sample properties for optimal imaging at low-voltage conditions.
{"title":"A study of in-the-column detector micrograph contrast in low-voltage scanning electron microscopy","authors":"Asia Matatyaho Ya'akobi, Irina Davidovich, Yeshayahu Talmon","doi":"10.1016/j.micron.2025.103978","DOIUrl":"10.1016/j.micron.2025.103978","url":null,"abstract":"<div><div>Scanning electron microscopy (SEM) is a widely used technique in science and engineering, traditionally performed at electron beam acceleration voltages (BAVs) above 5 kV. However, progress in field emission guns and SEM technology have made low-voltage SEM imaging more available. Low-voltage SEM offers significant advantages, such as high-resolution imaging and the imaging of non-coated insulating specimens without charging artifacts. Nevertheless, there is limited research on electron-specimen interactions and the influence of SEM operational parameters on the obtained micrograph at the low-voltage range. This study focuses on low-voltage SEM imaging, below 2 kV, using a high-resolution in-the-lens detector. We investigated the effects of BAV and working distance (WD) on micrograph contrast and resolution. Carbon nanotubes and boron nitride nanotubes, two very important advanced materials, were used as model specimens of conductive and non-conductive materials, respectively, and silicon wafers and glass slides were used as model conductive and non-conductive substrates. We found that optimal imaging conditions differ with specimen properties; optimal results were typically obtained at low BAV (0.8–1.2 kV) and short WD (below 3 mm). Additionally, we show that substrate conductivity affects micrograph quality. Counterintuitively, insulating substrates provide better results in some cases. These findings emphasize the importance of optimizing SEM imaging parameters, and choosing the substrate according to sample properties for optimal imaging at low-voltage conditions.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"202 ","pages":"Article 103978"},"PeriodicalIF":2.2,"publicationDate":"2025-11-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145687553","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-11-30DOI: 10.1016/j.micron.2025.103975
Yaqiong Ge, Yan Yin, Yue Song, Lina Wang, Qingling Hou, Zexin Chang, Wen Yang
Laser powder bed fusion (LPBF) technology provides a new approach for microstructure control of high entropy alloys (HEAs) through layer-by-layer stacking and rapid solidification characteristics. This study focuses on the Al0.5CoCrFeNi HEAs and systematically investigates the effects of different interlayer rotation angles (0°, 67°, 90°) on the porosity, grain orientation, phase distribution, and mechanical properties of LPBF formed HEAs. The results showed that the interlayer rotation angle significantly controlled the grain morphology and grain boundary characteristics by changing the thermal accumulation and gradient direction of the melt pool. At a rotation angle of 67°, the melt pool size increased, the porosity decreased to 2.05 %, and the proportion of high angle grain boundaries (HAGB) increased to 31.34 %. Combining EBSD and TEM analysis, it was found that at the rotation angle of 67°, the BCC phase content increased to 8.36 %, the preferred grain orientation weakened, the degree of recrystallization increased to 7.69 %, and the dislocation network density decreased to 1.18 × 1014m−2. These promoted the tensile strength to 733.53 MPa, an increase of 36.9 % compared to the 0° sample and 6.4 % compared to the 90° sample. This study reveals the coupling mechanism of interlayer rotation angle on the ‘thermal-mechanical-microstructure’ of LPBF formed HEAs, providing theoretical support for the optimization of additive manufacturing processes for high-performance complex structural alloys.
{"title":"Effect of interlayer deposition strategy on thermal characteristics and multiphase synergistic strengthening of HEAs prepared by LPBF","authors":"Yaqiong Ge, Yan Yin, Yue Song, Lina Wang, Qingling Hou, Zexin Chang, Wen Yang","doi":"10.1016/j.micron.2025.103975","DOIUrl":"10.1016/j.micron.2025.103975","url":null,"abstract":"<div><div>Laser powder bed fusion (LPBF) technology provides a new approach for microstructure control of high entropy alloys (HEAs) through layer-by-layer stacking and rapid solidification characteristics. This study focuses on the Al<sub>0.5</sub>CoCrFeNi HEAs and systematically investigates the effects of different interlayer rotation angles (0°, 67°, 90°) on the porosity, grain orientation, phase distribution, and mechanical properties of LPBF formed HEAs. The results showed that the interlayer rotation angle significantly controlled the grain morphology and grain boundary characteristics by changing the thermal accumulation and gradient direction of the melt pool. At a rotation angle of 67°, the melt pool size increased, the porosity decreased to 2.05 %, and the proportion of high angle grain boundaries (HAGB) increased to 31.34 %. Combining EBSD and TEM analysis, it was found that at the rotation angle of 67°, the BCC phase content increased to 8.36 %, the preferred grain orientation weakened, the degree of recrystallization increased to 7.69 %, and the dislocation network density decreased to 1.18 × 10<sup>14</sup>m<sup>−2</sup>. These promoted the tensile strength to 733.53 MPa, an increase of 36.9 % compared to the 0° sample and 6.4 % compared to the 90° sample. This study reveals the coupling mechanism of interlayer rotation angle on the ‘thermal-mechanical-microstructure’ of LPBF formed HEAs, providing theoretical support for the optimization of additive manufacturing processes for high-performance complex structural alloys.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"202 ","pages":"Article 103975"},"PeriodicalIF":2.2,"publicationDate":"2025-11-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145651926","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-11-30DOI: 10.1016/j.micron.2025.103976
Luo Sung Hong , Fu-ming Xiaoyu
The variation of texture, grain size, grain boundaries, and hardness of the composite layers has been examined at different deformation passes and regions of the Cu (matrix)–Mg (reinforcement) composite and the Mg (matrix)–Cu (reinforcement) composite. The multilayered composites were processed by the accumulative roll bonding (ARB) method. With the rise of ARB passes, the layers became wavy, then necked, and were finally broken into smaller layers. Rolling texture and shear texture were the predominant textures in the rolled composites. The rolling texture grew with increasing ARB pass. Also, the intensity of the shear texture increased in regions closer to the surfaces. Furthermore, a grain size decrement was observed in all layers, even though the Cu layer in the Cu/Mg/Cu and the Mg layer in the Mg/Cu/Mg showed finer grains than when these layers were used as inner layers. Additionally, the grain sizes gradually increased from near-surface regions to near-center regions. Based on kernel average misorientation (KAM) images, more evident strain was accumulated near boundaries in regions closer to the surfaces. Furthermore, the hardness measurements showed a reduction from the composite’s surface to the composite’s center, although all matrix and reinforcing layers showed an increase in hardness with increasing ARB pass.
{"title":"In-depth analysis of grain structure of heavily-deformed multilayered composites by electron backscattered diffraction","authors":"Luo Sung Hong , Fu-ming Xiaoyu","doi":"10.1016/j.micron.2025.103976","DOIUrl":"10.1016/j.micron.2025.103976","url":null,"abstract":"<div><div>The variation of texture, grain size, grain boundaries, and hardness of the composite layers has been examined at different deformation passes and regions of the Cu (matrix)–Mg (reinforcement) composite and the Mg (matrix)–Cu (reinforcement) composite. The multilayered composites were processed by the accumulative roll bonding (ARB) method. With the rise of ARB passes, the layers became wavy, then necked, and were finally broken into smaller layers. Rolling texture and shear texture were the predominant textures in the rolled composites. The rolling texture grew with increasing ARB pass. Also, the intensity of the shear texture increased in regions closer to the surfaces. Furthermore, a grain size decrement was observed in all layers, even though the Cu layer in the Cu/Mg/Cu and the Mg layer in the Mg/Cu/Mg showed finer grains than when these layers were used as inner layers. Additionally, the grain sizes gradually increased from near-surface regions to near-center regions. Based on kernel average misorientation (KAM) images, more evident strain was accumulated near boundaries in regions closer to the surfaces. Furthermore, the hardness measurements showed a reduction from the composite’s surface to the composite’s center, although all matrix and reinforcing layers showed an increase in hardness with increasing ARB pass.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"202 ","pages":"Article 103976"},"PeriodicalIF":2.2,"publicationDate":"2025-11-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145743302","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-11-28DOI: 10.1016/j.micron.2025.103965
Michéle Brugger-Hatzl , Verena Reisecker , Anas Alatrash , Martina Dienstleder , Evelin Fisslthaler , Daniel Knez , Gerald Kothleitner
Correlative microscopy has gained increasing importance across a range of research disciplines. Combining different microscopy techniques broadens knowledge about a sample by providing more comprehensive insights. In particular, the correlation of atomic force microscopy (AFM) and transmission electron microscopy (TEM) offers a powerful complementary approach for investigating materials, as both surface and subsurface information can be obtained. The fundamental motivation of this study is to establish a direct correlation between measurements obtained from the same specimen region by both methods. Such correlation is not always straightforward, as each technique requires different sample preparation. Consequently, performing AFM measurements on TEM samples inevitably gives rise to several challenges, including, but not limited to, surface distortion and limited accessibility. In this study, we propose a range of AFM measurement strategies tailored to two typical TEM sample types: a 3 nm thin membrane on lacey carbon and a TEM lamella mounted on a lift-out grid. We compare the influence of different cantilever dimensions and AFM modes on image quality, and explore the fabrication of AFM tips positioned at the very front of a cantilever via focused electron beam induced deposition to improve accessibility of regions of interest. With the strategies developed here, we successfully demonstrate the feasibility of AFM measurements on TEM samples without the need for additional sample preparation, enabling direct correlation. The results highlight the practical viability of this combined approach, and expand the scope of correlative microscopy for advanced materials characterization.
{"title":"Feasibility and strategies for direct atomic force microscopy on standard transmission electron microscopy specimens","authors":"Michéle Brugger-Hatzl , Verena Reisecker , Anas Alatrash , Martina Dienstleder , Evelin Fisslthaler , Daniel Knez , Gerald Kothleitner","doi":"10.1016/j.micron.2025.103965","DOIUrl":"10.1016/j.micron.2025.103965","url":null,"abstract":"<div><div>Correlative microscopy has gained increasing importance across a range of research disciplines. Combining different microscopy techniques broadens knowledge about a sample by providing more comprehensive insights. In particular, the correlation of atomic force microscopy (AFM) and transmission electron microscopy (TEM) offers a powerful complementary approach for investigating materials, as both surface and subsurface information can be obtained. The fundamental motivation of this study is to establish a direct correlation between measurements obtained from the same specimen region by both methods. Such correlation is not always straightforward, as each technique requires different sample preparation. Consequently, performing AFM measurements on TEM samples inevitably gives rise to several challenges, including, but not limited to, surface distortion and limited accessibility. In this study, we propose a range of AFM measurement strategies tailored to two typical TEM sample types: a 3 nm thin membrane on lacey carbon and a TEM lamella mounted on a lift-out grid. We compare the influence of different cantilever dimensions and AFM modes on image quality, and explore the fabrication of AFM tips positioned at the very front of a cantilever via focused electron beam induced deposition to improve accessibility of regions of interest. With the strategies developed here, we successfully demonstrate the feasibility of AFM measurements on TEM samples without the need for additional sample preparation, enabling direct correlation. The results highlight the practical viability of this combined approach, and expand the scope of correlative microscopy for advanced materials characterization.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"202 ","pages":"Article 103965"},"PeriodicalIF":2.2,"publicationDate":"2025-11-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145678179","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-11-22DOI: 10.1016/j.micron.2025.103964
Hiroshi Okamoto
Rotation of the electron spin in an inhomogeneous magnetic field in the magnetic electron lens causes a partial loss of coherence. Such incoherence entails non-ideal focusing properties of an electron lens. Although this effect should be small in the current electron-optical systems, we show that the effect could be a non-negligible factor in an aberration-corrected system with an electron probe with a large half angle in the future. A semiclassical framework for evaluating the effect is described. We emphasize that the incoherence effect manifests itself for the spin unpolarized electron beam as well.
{"title":"Loss of coherence in a magnetic electron lens due to spin rotation","authors":"Hiroshi Okamoto","doi":"10.1016/j.micron.2025.103964","DOIUrl":"10.1016/j.micron.2025.103964","url":null,"abstract":"<div><div>Rotation of the electron spin in an inhomogeneous magnetic field in the magnetic electron lens causes a partial loss of coherence. Such incoherence entails non-ideal focusing properties of an electron lens. Although this effect should be small in the current electron-optical systems, we show that the effect could be a non-negligible factor in an aberration-corrected system with an electron probe with a large half angle in the future. A semiclassical framework for evaluating the effect is described. We emphasize that the incoherence effect manifests itself for the spin <em>un</em>polarized electron beam as well.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"201 ","pages":"Article 103964"},"PeriodicalIF":2.2,"publicationDate":"2025-11-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145620883","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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