The significance of the synthesis method for graphite-like carbon: effects of acidifying agents on properties and carbon monoxide sensitivity

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-02-14 DOI:10.1007/s10854-025-14378-x
Hassan Azimi-Juybari, Mohammad-Mehdi Bagheri Mohagheghi
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Abstract

This study aimed to synthesize graphite-like activated carbon with different morphologies using the solvothermal method and to evaluate the effects of different acidifying agents on the structure, morphology, porosity, CO gas sensitivity, and optical properties. Graphite-like activated carbon was synthesized using the solvothermal method in an autoclave at 160 °C with four acidic agents: hydrochloric acid (HCl), phosphoric acid (H3PO4), sulfuric acid (H2SO4) and nitric acid (HNO3). The activated carbon was produced using carbon black powder obtained from the carbonization process and the combustion of almond skin waste at 600 °C. The properties of the synthesized activated carbon were analyzed by XRD, FESEM, BET, UV–Vis spectrophotometry, and FTIR spectroscopy. The XRD analysis revealed that the AC-HNO3 sample had the most graphite-like structure, with a d002 value of 3.67 Å and an Lc value of 10.02 Å. The 002 peak appeared near 2θ = 23°, and the 10L peak was observed as a broad peak near 2θ = 43°. The FESEM images showed that the carbon black sample had no pores, while the AC-HNO3 sample had the highest porosity and the most uniform pore size, with pore sizes around 950 nm. The BET analysis also confirmed the largest specific surface area of the AC-HNO3 sample with a surface area (\({S}_{BET}\)) = 340 m2/g, which correlates with the superior light absorption capabilities compared to 67 m2/g for carbon black. The absorption spectrum demonstrated enhanced light absorption for all synthesized activated carbons compared to carbon black, with the AC-HNO3 sample exhibiting the highest optical absorption coefficient (α) in the order of 106. Optical band gap calculations showed a reduction in the energy gap (Eg) from 3.83 eV for carbon black to 3.28 eV for the AC-HNO3 sample through activation with different acidic solvents using the solvothermal method. The FTIR spectroscopy detected several functional groups in all samples, including OH, CH2, C=C, and CH aromatic, across all samples. According to the carbon monoxide (CO) gas sensing characterization, the AC-HNO3 sample exhibited the highest sensitivity at S = 9.3%, while carbon black showed the lowest sensitivity at 2.1%. These results indicated that the AC-HNO3 sample, with its high porosity, large specific surface area, and superior gas sensitivity, could have been effectively utilized in industrial applications such as water treatment, air filtration, and gas sensing.

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类石墨碳合成方法的意义:酸化剂对性能和一氧化碳敏感性的影响
本研究旨在利用溶剂热法合成不同形貌的类石墨活性炭,并考察不同酸化剂对其结构、形貌、孔隙度、CO气敏性和光学性能的影响。以盐酸(HCl)、磷酸(H3PO4)、硫酸(H2SO4)和硝酸(HNO3)为原料,在160℃的高压釜中采用溶剂热法制备了类石墨活性炭。活性炭是用炭化过程中得到的炭黑粉和杏仁皮废料在600℃下燃烧制备的。采用XRD、FESEM、BET、UV-Vis、FTIR等方法对合成的活性炭进行了性能分析。XRD分析表明,AC-HNO3样品具有最像石墨的结构,d002值为3.67 Å, Lc值为10.02 Å。002峰在2θ = 23°附近出现,10L峰在2θ = 43°附近出现宽峰。FESEM图像显示炭黑样品没有孔隙,AC-HNO3样品孔隙率最高,孔径最均匀,孔径在950 nm左右。BET分析还证实了AC-HNO3样品的最大比表面积(\({S}_{BET}\)) = 340 m2/g,与炭黑的67 m2/g相比,这与AC-HNO3样品优越的光吸收能力有关。吸收光谱表明,与炭黑相比,所有合成活性炭的光吸收都增强,其中AC-HNO3样品的光吸收系数(α)最高,约为106。光学带隙计算表明,通过溶剂热法活化不同酸性溶剂,AC-HNO3样品的能隙(Eg)从炭黑的3.83 eV减小到3.28 eV。FTIR光谱在所有样品中检测到几种官能团,包括OH, CH2, C=C和CH芳香。根据一氧化碳(CO)气敏特性,AC-HNO3样品在S = 9.3时灵敏度最高%, while carbon black showed the lowest sensitivity at 2.1%. These results indicated that the AC-HNO3 sample, with its high porosity, large specific surface area, and superior gas sensitivity, could have been effectively utilized in industrial applications such as water treatment, air filtration, and gas sensing.
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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