Enhanced self-cleaning performance of WO3/BiVO4semiconductor thin-film coatings on ceramic tiles through photocatalytic organic and microbial degradation

IF 4.6 3区工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2025-02-18 DOI:10.1016/j.mssp.2025.109385

Farut supanantin , Nuanlaor Yamao , Naris Barnthip , Chatchai Ponchio

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Abstract

The accumulation of stains and pathogens on sanitary tiles in public and workplaces poses significant challenges to maintaining hygiene and cleanliness. Conventional chemical cleaning procedures are harmful to the environment and frequently present health risks. This research introduces a sustainable and energy-efficient solution utilizing photocatalytic semiconductor thin films, specifically TiO₂, WO₃, BiVO₄, and a WO₃/BiVO₄ heterojunction, performed by an automated dip-coating technique. A comprehensive characterization of the semiconductor-coated ceramic tiles, including chemical composition, morphology, contact angle, crystalline structure, and photocatalytic degradation efficiency, was performed under visible light irradiation. The WO₃/BiVO₄ heterojunction demonstrated outstanding efficacy, accomplishing 100 % organic dye degradation within 30 min, compared to around 15 % for single semiconductor coatings. Pesticide removal, which are colorless dangerous organic substances, was investigated as well to validate photocatalysis of organic compound removal procedure. The heterojunction improved the hydrophilic characteristics of the tiles, facilitating water dispersion and the resulting generation of reactive oxygen species essential for efficient organic and microbial decomposition. The uniform morphology and high crystalline structure of WO₃/BiVO₄ facilitated effective charge separation, markedly enhancing photocatalytic activity. Furthermore, all evaluated semiconductor coatings exhibited up to 99 % antibacterial efficiency, highlighting their potential for hygienic applications. These findings highlight the potential of WO₃/BiVO₄-coated ceramic tiles as an innovative, environmentally sustainable solution for maintaining cleanliness in healthcare facilities, public places, and other locations necessitating rigorous hygiene standards. The present research encourages the development of a novel substitute for environmentally and health-harming self-cleaning surfaces that eliminates the hazards attributed to traditional cleaning techniques.

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通过光催化有机和微生物降解提高陶瓷表面WO3/ bivo4半导体薄膜涂层的自清洁性能

公共场所和工作场所卫生瓷砖上的污渍和病原体的积累对保持卫生和清洁构成了重大挑战。传统的化学清洁程序对环境有害，并经常带来健康风险。本研究介绍了一种可持续和节能的解决方案，利用光催化半导体薄膜，特别是TiO2， WO3， BiVO4和WO3/BiVO4异质结，通过自动化浸涂技术进行。在可见光照射下，对半导体涂层瓷砖进行了全面的表征，包括化学成分、形貌、接触角、晶体结构和光催化降解效率。WO3/BiVO4异质结表现出出色的效率，在30分钟内实现100%的有机染料降解，而单一半导体涂层的降解率约为15%。研究了光催化法去除无色有害有机物质农药的效果，验证了光催化法去除有机化合物的效果。异质结改善了瓷砖的亲水性，促进了水的分散，并产生了有效的有机和微生物分解所必需的活性氧。WO3/BiVO4的均匀形态和高结晶结构有利于有效的电荷分离，显著提高光催化活性。此外，所有被评估的半导体涂层都显示出高达99%的抗菌效率，突出了它们在卫生应用方面的潜力。这些发现突出了WO3/ bivo4涂层瓷砖作为一种创新的、环境可持续的解决方案的潜力，可用于保持医疗机构、公共场所和其他需要严格卫生标准的场所的清洁。目前的研究鼓励开发一种新的替代品，以取代对环境和健康有害的自清洁表面，消除传统清洁技术带来的危害。

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来源期刊

Materials Science in Semiconductor Processing 工程技术-材料科学：综合

CiteScore

8.00

自引率

4.90%

发文量

780

审稿时长

42 days

期刊介绍： Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.