Enhanced self-cleaning performance of WO3/BiVO4semiconductor thin-film coatings on ceramic tiles through photocatalytic organic and microbial degradation

IF 4.2 3区工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2025-02-18 DOI:10.1016/j.mssp.2025.109385

Farut supanantin , Nuanlaor Yamao , Naris Barnthip , Chatchai Ponchio

{"title":"Enhanced self-cleaning performance of WO3/BiVO4semiconductor thin-film coatings on ceramic tiles through photocatalytic organic and microbial degradation","authors":"Farut supanantin , Nuanlaor Yamao , Naris Barnthip , Chatchai Ponchio","doi":"10.1016/j.mssp.2025.109385","DOIUrl":null,"url":null,"abstract":"<div><div>The accumulation of stains and pathogens on sanitary tiles in public and workplaces poses significant challenges to maintaining hygiene and cleanliness. Conventional chemical cleaning procedures are harmful to the environment and frequently present health risks. This research introduces a sustainable and energy-efficient solution utilizing photocatalytic semiconductor thin films, specifically TiO2, WO3, BiVO4, and a WO3/BiVO4 heterojunction, performed by an automated dip-coating technique. A comprehensive characterization of the semiconductor-coated ceramic tiles, including chemical composition, morphology, contact angle, crystalline structure, and photocatalytic degradation efficiency, was performed under visible light irradiation. The WO3/BiVO4 heterojunction demonstrated outstanding efficacy, accomplishing 100 % organic dye degradation within 30 min, compared to around 15 % for single semiconductor coatings. Pesticide removal, which are colorless dangerous organic substances, was investigated as well to validate photocatalysis of organic compound removal procedure. The heterojunction improved the hydrophilic characteristics of the tiles, facilitating water dispersion and the resulting generation of reactive oxygen species essential for efficient organic and microbial decomposition. The uniform morphology and high crystalline structure of WO3/BiVO4 facilitated effective charge separation, markedly enhancing photocatalytic activity. Furthermore, all evaluated semiconductor coatings exhibited up to 99 % antibacterial efficiency, highlighting their potential for hygienic applications. These findings highlight the potential of WO3/BiVO4-coated ceramic tiles as an innovative, environmentally sustainable solution for maintaining cleanliness in healthcare facilities, public places, and other locations necessitating rigorous hygiene standards. The present research encourages the development of a novel substitute for environmentally and health-harming self-cleaning surfaces that eliminates the hazards attributed to traditional cleaning techniques.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"191 ","pages":"Article 109385"},"PeriodicalIF":4.2000,"publicationDate":"2025-02-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800125001222","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}

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Abstract

The accumulation of stains and pathogens on sanitary tiles in public and workplaces poses significant challenges to maintaining hygiene and cleanliness. Conventional chemical cleaning procedures are harmful to the environment and frequently present health risks. This research introduces a sustainable and energy-efficient solution utilizing photocatalytic semiconductor thin films, specifically TiO₂, WO₃, BiVO₄, and a WO₃/BiVO₄ heterojunction, performed by an automated dip-coating technique. A comprehensive characterization of the semiconductor-coated ceramic tiles, including chemical composition, morphology, contact angle, crystalline structure, and photocatalytic degradation efficiency, was performed under visible light irradiation. The WO₃/BiVO₄ heterojunction demonstrated outstanding efficacy, accomplishing 100 % organic dye degradation within 30 min, compared to around 15 % for single semiconductor coatings. Pesticide removal, which are colorless dangerous organic substances, was investigated as well to validate photocatalysis of organic compound removal procedure. The heterojunction improved the hydrophilic characteristics of the tiles, facilitating water dispersion and the resulting generation of reactive oxygen species essential for efficient organic and microbial decomposition. The uniform morphology and high crystalline structure of WO₃/BiVO₄ facilitated effective charge separation, markedly enhancing photocatalytic activity. Furthermore, all evaluated semiconductor coatings exhibited up to 99 % antibacterial efficiency, highlighting their potential for hygienic applications. These findings highlight the potential of WO₃/BiVO₄-coated ceramic tiles as an innovative, environmentally sustainable solution for maintaining cleanliness in healthcare facilities, public places, and other locations necessitating rigorous hygiene standards. The present research encourages the development of a novel substitute for environmentally and health-harming self-cleaning surfaces that eliminates the hazards attributed to traditional cleaning techniques.

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来源期刊

Materials Science in Semiconductor Processing 工程技术-材料科学：综合

CiteScore

8.00

自引率

4.90%

发文量

780

审稿时长

42 days

期刊介绍： Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.