Hf Doping for Defect and Carrier Management in Magnetron-Sputtered Tin Oxide Electron Transport Layers for Perovskite Solar Cells

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-02-18 DOI:10.1021/acsami.4c20568
Shuai Lan, Geon Woo Yoon, Fang Luo, Qi Zhang, Hyun Suk Jung, Euy Heon Hwang, Han-Ki Kim
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Abstract

The performance of perovskite solar cells (PSCs) with magnetron-sputtered tin oxide (SnOx) electron transport layers (ETLs) is strongly influenced by the optical and electrical characteristics of the SnOx. However, magnetron-sputtered SnOx typically exhibits oxygen-vacancy (VO)-related point defects. This leads to significant interface charge recombination, which restricts both the open-circuit voltage (VOC) and fill factor (FF) of PSCs using SnOx ETLs. In this study, a Hf-doping strategy is proposed to enhance the transmittance of SnOx ETLs, reduce VO defects, and modulate the carrier density. The introduction of Hf dopants into SnOx successfully minimized VO-defect formation, as confirmed by Hall-effect measurements, X-ray absorption spectroscopy, and X-ray photoelectron spectroscopy, leading to a reduced carrier density in SnOx. Density functional theory simulations corroborated these experimental findings, revealing the mechanism behind VO suppression. PSCs incorporating HTO ETLs demonstrated marked improvements in key performance parameters, including short-circuit current density, VOC, and FF. Optimized HTO-based PSCs achieved an average power-conversion efficiency (PCE) of 18.23%, exhibiting a 14.2% increase compared with undoped SnOx-based devices. Additionally, the best-performing PSCs utilizing HTO ETLs achieved an optimal PCE of 21.2% under reverse scan and 19.9% under forward scan.

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ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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