Hf Doping for Defect and Carrier Management in Magnetron-Sputtered Tin Oxide Electron Transport Layers for Perovskite Solar Cells

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-02-18 DOI:10.1021/acsami.4c20568
Shuai Lan, Geon Woo Yoon, Fang Luo, Qi Zhang, Hyun Suk Jung, Euy Heon Hwang, Han-Ki Kim
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Abstract

The performance of perovskite solar cells (PSCs) with magnetron-sputtered tin oxide (SnOx) electron transport layers (ETLs) is strongly influenced by the optical and electrical characteristics of the SnOx. However, magnetron-sputtered SnOx typically exhibits oxygen-vacancy (VO)-related point defects. This leads to significant interface charge recombination, which restricts both the open-circuit voltage (VOC) and fill factor (FF) of PSCs using SnOx ETLs. In this study, a Hf-doping strategy is proposed to enhance the transmittance of SnOx ETLs, reduce VO defects, and modulate the carrier density. The introduction of Hf dopants into SnOx successfully minimized VO-defect formation, as confirmed by Hall-effect measurements, X-ray absorption spectroscopy, and X-ray photoelectron spectroscopy, leading to a reduced carrier density in SnOx. Density functional theory simulations corroborated these experimental findings, revealing the mechanism behind VO suppression. PSCs incorporating HTO ETLs demonstrated marked improvements in key performance parameters, including short-circuit current density, VOC, and FF. Optimized HTO-based PSCs achieved an average power-conversion efficiency (PCE) of 18.23%, exhibiting a 14.2% increase compared with undoped SnOx-based devices. Additionally, the best-performing PSCs utilizing HTO ETLs achieved an optimal PCE of 21.2% under reverse scan and 19.9% under forward scan.

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钙钛矿太阳能电池磁控溅射氧化锡电子输运层中Hf掺杂缺陷及载流子管理
具有磁控溅射氧化锡(SnOx)电子传输层(ETLs)的钙钛矿太阳能电池(PSCs)的性能受到SnOx光学和电学特性的强烈影响。然而,磁控溅射SnOx通常会出现与氧空位(VO)相关的点缺陷。这导致明显的界面电荷重组,这限制了使用SnOx etl的psc的开路电压(VOC)和填充因子(FF)。在本研究中,提出了一种高频掺杂策略,以提高SnOx etl的透过率,减少VO缺陷,并调节载流子密度。通过霍尔效应测量、x射线吸收光谱和x射线光电子能谱证实,在SnOx中引入Hf掺杂剂成功地减少了vo缺陷的形成,从而降低了SnOx中的载流子密度。密度泛函理论模拟证实了这些实验结果,揭示了VO抑制背后的机制。结合HTO etl的psc在关键性能参数上有显著改善,包括短路电流密度、VOC和FF。优化后的基于hto的PSCs平均功率转换效率(PCE)为18.23%,与未掺杂的基于snox的器件相比,提高了14.2%。此外,使用HTO etl的高性能psc在反向扫描下的最佳PCE为21.2%,在正向扫描下为19.9%。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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