{"title":"Adaptive Machine Learning-Enabled Evolutionary Optimization for Reliability-Based Design of Through Silicon Via (TSV) Structures Under Uncertainty","authors":"Zhonglin Jiang;Zequn Wang","doi":"10.1109/TCPMT.2025.3526591","DOIUrl":null,"url":null,"abstract":"Through silicon via (TSV) technology has been widely employed as a promising 3-D packaging technology to achieve significant reduction in device dimensions. Due to the existence of uncertainty in device dimension and material properties, significant thermal stress can be generated in TSV to detartrate the performance of TSV-based 3-D chips. This article presents an adaptive machine-learning-enabled evolutionary optimization approach for the reliability-based design of TSV structures under uncertainty. In detail, a finite element model is developed for TSV structures under thermal cycling loads to determine its thermomechanical performance. A Kriging model is then utilized to establish as a surrogate to predict the maximum thermal stress. With the surrogate model, an adaptive machine-learning-enabled efficient evolutionary optimization (aMLEO) approach is proposed to reduce the volume of TSV structures while enhancing their reliability.","PeriodicalId":13085,"journal":{"name":"IEEE Transactions on Components, Packaging and Manufacturing Technology","volume":"15 2","pages":"387-398"},"PeriodicalIF":2.3000,"publicationDate":"2025-01-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Components, Packaging and Manufacturing Technology","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10830287/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Through silicon via (TSV) technology has been widely employed as a promising 3-D packaging technology to achieve significant reduction in device dimensions. Due to the existence of uncertainty in device dimension and material properties, significant thermal stress can be generated in TSV to detartrate the performance of TSV-based 3-D chips. This article presents an adaptive machine-learning-enabled evolutionary optimization approach for the reliability-based design of TSV structures under uncertainty. In detail, a finite element model is developed for TSV structures under thermal cycling loads to determine its thermomechanical performance. A Kriging model is then utilized to establish as a surrogate to predict the maximum thermal stress. With the surrogate model, an adaptive machine-learning-enabled efficient evolutionary optimization (aMLEO) approach is proposed to reduce the volume of TSV structures while enhancing their reliability.
期刊介绍:
IEEE Transactions on Components, Packaging, and Manufacturing Technology publishes research and application articles on modeling, design, building blocks, technical infrastructure, and analysis underpinning electronic, photonic and MEMS packaging, in addition to new developments in passive components, electrical contacts and connectors, thermal management, and device reliability; as well as the manufacture of electronics parts and assemblies, with broad coverage of design, factory modeling, assembly methods, quality, product robustness, and design-for-environment.