Bubble Dynamics during Hydrogen Evolution Reaction over Fluidizable Electrocatalyst Particles

IF 3.8 3区 工程技术 Q2 ENGINEERING, CHEMICAL Industrial & Engineering Chemistry Research Pub Date : 2025-02-21 DOI:10.1021/acs.iecr.4c04934
Qing-Nan Wang, Yafei Qiao, Wei Qin, Haibing Zheng, Zijin Wang, Ben Chang, Xiaolei Qu, Wei Zhang, Tiefeng Liu, Can Li
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Abstract

Gas bubble adhesion, a ubiquitous phenomenon in electrochemical gas-evolving reactions, reduces the hydrogen evolution reaction (HER) activity in water electrolysis. Understanding the dynamics of gas bubble detachment and its dependence on force balance is crucial for manipulating bubble departure, but it remains insufficiently investigated. Here, we found that bubble dynamics differ markedly between fluidizable and stationary electrocatalysts, with fluidizable electrocatalysts minimizing bubble adhesion and showing a 37-fold increase in the HER rate constant. This enhancement is attributed to accelerated bubble detachment driven by the fluidization effect of the electrocatalyst particles. Specifically, the transition from stationary to fluidizable electrocatalysts marks a shift from a flat to a particulate model, introducing promoting effects arising from particle movement and spin-induced centrifugal force and bubble collision-triggered coalescence. Consequently, the measured HER activity approaches its intrinsic value. This work highlights fluidization as an effective strategy to eliminate bubble adhesion, thereby exposing nearly all active sites to electrocatalytic reactions.

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来源期刊
Industrial & Engineering Chemistry Research
Industrial & Engineering Chemistry Research 工程技术-工程:化工
CiteScore
7.40
自引率
7.10%
发文量
1467
审稿时长
2.8 months
期刊介绍: ndustrial & Engineering Chemistry, with variations in title and format, has been published since 1909 by the American Chemical Society. Industrial & Engineering Chemistry Research is a weekly publication that reports industrial and academic research in the broad fields of applied chemistry and chemical engineering with special focus on fundamentals, processes, and products.
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