Role of chlorine adsorption in regulating surface work functions of Cu–Sn alloy system: A first-principles study

IF 4.3 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Chemistry and Physics Pub Date : 2025-02-19 DOI:10.1016/j.matchemphys.2025.130566
Weiqi Guo , Yinghao Bi , Shuaifeng Zhao , Junbao Wu , Ping Wu
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Abstract

Cu–Sn alloys primarily undergo galvanic corrosion in chlorine-containing environments. The corrosion sequence is determined by the work function. In this study, the regulatory mechanism of surface work function was investigated for the adsorption of Cl atoms on the main components of Cu–Sn alloys: Cu, Sn, Cu6Sn5, and Cu3Sn. The results indicated that, on clean surfaces, the order of the work functions for the four structures did not align with the experimentally observed sequence of galvanic corrosion. However, when the Cl atom coverage on each surface exceeded 1/2, the work functions regulated by the chlorine atoms corresponded with the results observed in experiments. Through fitting, a linear relationship between the changes in surface dipole moment and work function was established. The interactions between Cl atoms on the Sn and Cu surfaces resulted in fluctuations in the work function, while the proximity of Cl atoms to the surface on the Cu3Sn structure led to a slower variation in its work function. Consequently, under the regulation of Cl atoms, the differences in work function changes among the four structures resulted in a redistribution of the work function magnitudes. This redistribution of work functions provides new insights into the corrosion mechanism of Cu–Sn alloys and suggests potential strategies for corrosion prevention.
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来源期刊
Materials Chemistry and Physics
Materials Chemistry and Physics 工程技术-材料科学:综合
CiteScore
8.70
自引率
4.30%
发文量
1515
审稿时长
69 days
期刊介绍: Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.
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