Self-Assembly and 3D Printing of SiCw@MXene/SiOC Metastructure Toward Simultaneously Excellent Terahertz Electromagnetic Interference (EMI) Shielding and Electron-to-Thermal Conversion Properties

IF 19 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY Advanced Functional Materials Pub Date : 2025-02-24 DOI:10.1002/adfm.202500970
Ruyue Su, Pingan Liu, Jingyi Chen, Wenqing Wang, Xiaotong Chen, Rujie He, Ying Li
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Abstract

The great application potential of terahertz (THz) waves in communication, imaging, and other cutting-edge fields makes them vulnerable to harsh environments. THz electromagnetic interference (EMI) shielding materials that are applicable in capable of with standing harsh environments are critically important for ensuring the reliable operation of electronic devices and are urgently needed. Herein, UV light-cured SiC whisker (SiCw)@MXene/SiOC composites with different SiCw:MXene mass ratios are developed through electrostatic self-assembly. The influence of MXene exfoliation routes and SiCw:MXene mass ratios on the THz EMI shielding performance of SiCw@MXene/SiOC are investigated in deep. The results indicated that SiCw@HF-MXene/SiOC with the SiCw:MXene mass ratio of 1:1 exhibited the best THz EMI shielding performance, and the abundant heterointerfaces formed between SiCw and MXene enhanced THz wave attenuation. Subsequently, SiCw@MXene/SiOC Gyroid triple periodic minimal surface (TPMS) metastructures are fabricated by vat photopolymerization (VPP) 3D printing. All of the obtained metastructures with a thickness of 1.3–2.7 mm exhibited superior THz EMI shielding properties with an average shielding efficiency (SE) of 58.6–66.4 dB in 0.2–1.6 THz. Moreover, the developed Gyroid-2.5 metastructure even exhibited low thermal conductivity and electron-to-thermal conversion properties. The developed Gyroid metastructure facilitates the development of next-generation THz EMI shielding materials in harsh environments.

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自组装和3D打印SiCw@MXene/SiOC元结构同时具有优异的太赫兹电磁干扰(EMI)屏蔽和电子-热转换性能
太赫兹(THz)波在通信、成像和其他前沿领域的巨大应用潜力使它们容易受到恶劣环境的影响。适用于长期恶劣环境的太赫兹电磁干扰(EMI)屏蔽材料对于确保电子设备的可靠运行至关重要,是迫切需要的。通过静电自组装,制备了具有不同SiCw:MXene质量比的紫外光固化SiC晶须(SiCw)@MXene/SiOC复合材料。深入研究了MXene剥离路径和SiCw:MXene质量比对SiCw@MXene/SiOC屏蔽太赫兹电磁干扰性能的影响。结果表明,SiCw:MXene质量比为1:1的SiCw@HF-MXene/SiOC对太赫兹EMI的屏蔽性能最好,SiCw与MXene之间形成丰富的异质界面增强了太赫兹波的衰减。随后,通过还原光聚合(VPP) 3D打印制备了SiCw@MXene/SiOC Gyroid三周期最小表面(TPMS)元结构。所获得的厚度为1.3 ~ 2.7 mm的元结构在0.2 ~ 1.6 THz范围内的平均屏蔽效率(SE)为58.6 ~ 66.4 dB,具有优异的太赫兹电磁干扰屏蔽性能。此外,开发的Gyroid-2.5元结构甚至表现出低导热性和电子-热转换性能。开发的Gyroid元结构有助于在恶劣环境中开发下一代太赫兹EMI屏蔽材料。
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来源期刊
Advanced Functional Materials
Advanced Functional Materials 工程技术-材料科学:综合
CiteScore
29.50
自引率
4.20%
发文量
2086
审稿时长
2.1 months
期刊介绍: Firmly established as a top-tier materials science journal, Advanced Functional Materials reports breakthrough research in all aspects of materials science, including nanotechnology, chemistry, physics, and biology every week. Advanced Functional Materials is known for its rapid and fair peer review, quality content, and high impact, making it the first choice of the international materials science community.
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