In Situ X-Ray Photoelectron Spectroscopy Study of Atomic Layer Deposited Cerium Oxide on SiO2: Substrate Influence on the Reaction Mechanism During the Early Stages of Growth (Adv. Mater. Interfaces 5/2025)
Carlos Morales, Max Gertig, Małgorzata Kot, Carlos Alvarado, Markus Andreas Schubert, Marvin Hartwig Zoellner, Christian Wenger, Karsten Henkel, Jan Ingo Flege
{"title":"In Situ X-Ray Photoelectron Spectroscopy Study of Atomic Layer Deposited Cerium Oxide on SiO2: Substrate Influence on the Reaction Mechanism During the Early Stages of Growth (Adv. Mater. Interfaces 5/2025)","authors":"Carlos Morales, Max Gertig, Małgorzata Kot, Carlos Alvarado, Markus Andreas Schubert, Marvin Hartwig Zoellner, Christian Wenger, Karsten Henkel, Jan Ingo Flege","doi":"10.1002/admi.202570012","DOIUrl":null,"url":null,"abstract":"<p><b>Atomic Layer Deposition</b></p><p>Understanding complex growth mechanisms and interface effects is crucial for tuning the properties of ultrathin functional materials. In article 2400537, Jan Ingo Flege and co-workers have utilized classic surface techniques for in situ characterization of atomic-layer-deposited cerium oxide to unravel film-substrate interactions and determine, depending on the film thickness, the growth behavior and chemistry of this prototypical reducible oxide.\n\n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 5","pages":""},"PeriodicalIF":4.3000,"publicationDate":"2025-02-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202570012","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Materials Interfaces","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/admi.202570012","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Atomic Layer Deposition
Understanding complex growth mechanisms and interface effects is crucial for tuning the properties of ultrathin functional materials. In article 2400537, Jan Ingo Flege and co-workers have utilized classic surface techniques for in situ characterization of atomic-layer-deposited cerium oxide to unravel film-substrate interactions and determine, depending on the film thickness, the growth behavior and chemistry of this prototypical reducible oxide.
期刊介绍:
Advanced Materials Interfaces publishes top-level research on interface technologies and effects. Considering any interface formed between solids, liquids, and gases, the journal ensures an interdisciplinary blend of physics, chemistry, materials science, and life sciences. Advanced Materials Interfaces was launched in 2014 and received an Impact Factor of 4.834 in 2018.
The scope of Advanced Materials Interfaces is dedicated to interfaces and surfaces that play an essential role in virtually all materials and devices. Physics, chemistry, materials science and life sciences blend to encourage new, cross-pollinating ideas, which will drive forward our understanding of the processes at the interface.
Advanced Materials Interfaces covers all topics in interface-related research:
Oil / water separation,
Applications of nanostructured materials,
2D materials and heterostructures,
Surfaces and interfaces in organic electronic devices,
Catalysis and membranes,
Self-assembly and nanopatterned surfaces,
Composite and coating materials,
Biointerfaces for technical and medical applications.
Advanced Materials Interfaces provides a forum for topics on surface and interface science with a wide choice of formats: Reviews, Full Papers, and Communications, as well as Progress Reports and Research News.