Direct Optical Lithography: Toward Nondestructive Patterning of Nanocrystal Emitters

Abstract

Figure 1. (A) Schematic illustration of the main parameters for next-generation display and (B) schematic illustration of strategies for nondestructive direct optical lithography process. Figure 2. Schematic illustrations and methods for the design of (A) photosensitive molecules and (B) ligand post-treatment. Figure 3. Schematic overview of challenges in direct optical lithography. S.M. and H.C. wrote the manuscript. S.M. conducted literature review and prepared figures. H.C. supervised the project. Seongkyu Maeng is currently a Ph.D. candidate in Materials Science and Engineering from Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea. He earned his B.S. (2022) and M.S. (2024) in Materials Science and Engineering from KAIST. His research focuses on the patterning of emissive nanomaterials. Himchan Cho is currently an Associate Professor in the Department of Materials Science and Engineering at Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea. He received his B.S. (2012) and Ph.D. (2016) in Materials Science and Engineering from the Pohang University of Science and Technology (POSTECH), Republic of Korea. Following his doctoral studies, he worked as a postdoctoral scholar at Seoul National University (2016–2018) and the University of Chicago (2018–2021) before he joined KAIST in 2021. His research interests focus on synthesis, patterning, and device applications of metal halide perovskites and colloidal quantum dots. This work was supported by National Research Foundation of Korea (NRF) grants funded by the Ministry of Science and ICT, Korea: RS-2022-NR068226 (2022M3H4A1A04096380) and RS-2024-00416583. This article references 35 other publications. This article has not yet been cited by other publications.