Ultralow frequency interlayer mode from suppressed van der Waals coupling in polar Janus SMoSe/SWSe heterostructure

IF 9.7 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Today Physics Pub Date : 2025-04-01 Epub Date: 2025-03-05 DOI:10.1016/j.mtphys.2025.101689
Kai Ren , Ke Wang , Yi Luo , Minglei Sun , Tariq Altalhi , Boris I. Yakobson , Gang Zhang
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Abstract

The broken mirror symmetry in Janus SMoSe and SWSe monolayers induces novel properties for photocatalytic, thermoelectric and photocatalytic devices. Interlayer coupling is critical in van der Waals (vdW) heterostructure for quantum transport and polaritonics. We investigate Janus SMoSe/SWSe vdW heterostructures with three stacking interfaces: S-S, S-Se, and Se-Se. The S-Se SMoSe/SWSe vdW heterostructure with lowest symmetry exhibits ultralow frequencies of in-plane shear (1.94 cm−1) and out-of-plane breathing (4.47 cm−1) modes due to weaker interlayer vdW restoring forces and a significant intrinsic vertical dipole moment. The reduced restoring forces are caused by the critical charge transfer across the vdW interface. Thus, the larger interlayer spacing in the S-Se SMoSe/SWSe heterostructure results in the suppressed vdW interlayer coupling for ultralow phonon frequencies. These findings advance understanding of tuning vdW coupling in polar Janus SMoSe/SWSe heterostructures by stacking engineering, providing theoretical insights for designing tunable nanoelectronic devices.

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极性Janus SMoSe/SWSe异质结构中抑制范德华耦合的超低频层间模
在Janus SMoSe和SWSe单层中,镜面对称性的破坏导致了光催化、热电和光催化器件的新特性。层间耦合是量子输运和极化电子学中范德华异质结构的关键。我们研究了具有三种堆叠界面的Janus SMoSe/SWSe vdW异质结构:S-S, S-Se和Se-Se。对称性最低的S-Se SMoSe/SWSe vdW异质结构由于层间vdW恢复力较弱和显著的本征垂直偶极矩,表现出面内剪切模式(1.94 cm−1)和面外呼吸模式(4.47 cm−1)的超低频率。还原力的减小是由临界电荷在vdW界面上的传递引起的。因此,S-Se SMoSe/SWSe异质结构中较大的层间间距导致超低声子频率下vdW层间耦合受到抑制。这些发现通过堆叠工程加深了对极性Janus SMoSe/SWSe异质结构中调谐vdW耦合的理解,为设计可调谐纳米电子器件提供了理论见解。
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来源期刊
Materials Today Physics
Materials Today Physics Materials Science-General Materials Science
CiteScore
14.00
自引率
7.80%
发文量
284
审稿时长
15 days
期刊介绍: Materials Today Physics is a multi-disciplinary journal focused on the physics of materials, encompassing both the physical properties and materials synthesis. Operating at the interface of physics and materials science, this journal covers one of the largest and most dynamic fields within physical science. The forefront research in materials physics is driving advancements in new materials, uncovering new physics, and fostering novel applications at an unprecedented pace.
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