{"title":"Magic Defect Site for Modulating Electron-Correlated Properties in Monolayer T-NbSe<sub>2</sub>.","authors":"Mengmeng Niu, Jiaqi Dai, Weikang Zhou, Chun Huang, Linlu Wu, Pengjie Guo, Cong Wang, Xu Wu, Wei Ji, Yeliang Wang, Jingsi Qiao","doi":"10.1002/smtd.202500038","DOIUrl":null,"url":null,"abstract":"<p><p>Defect engineering provides a precise and controlled approach to modify the localized electronic properties through crystalline interruption. In 2D electron-correlated materials, periodic lattice distortions often coexist with charge density waves (CDWs) and Mott insulating states, which are highly sensitive to local electronic environments. However, the influence of complex, inequivalent defect sites on electron-correlated properties, particularly Mott behavior, remains poorly understood. Here, density functional theory calculation is utilized to investigate the electron-correlated properties of monolayer T-NbSe<sub>2</sub> with various single selenium/niobium vacancies. It is found that a single vacancy can induce geometric alterations over several nanometers, distinguished from typical 2D materials. A unique selenium vacancy site can precisely eliminate Mott electrons of T-NbSe<sub>2</sub> and gradually lead the transitions from a ferromagnetic charge transfer insulator into a non-magnetic band insulator. Moreover, writing in and erasing Mott electrons can be flexibly manipulated by substituting the selenium site with arsenic, bromine, and potassium elements. The modulation mechanism by selenium vacancy originates from a synergistic combination of compressive strain and electron doping. The results systematically reveal that defect engineering is an ingenious strategy for atomically manipulating electron-correlated properties and manufacturing electronic patterns, enabling the control of Mott electrons in 2D materials.</p>","PeriodicalId":229,"journal":{"name":"Small Methods","volume":" ","pages":"e2500038"},"PeriodicalIF":10.7000,"publicationDate":"2025-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Small Methods","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/smtd.202500038","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
Defect engineering provides a precise and controlled approach to modify the localized electronic properties through crystalline interruption. In 2D electron-correlated materials, periodic lattice distortions often coexist with charge density waves (CDWs) and Mott insulating states, which are highly sensitive to local electronic environments. However, the influence of complex, inequivalent defect sites on electron-correlated properties, particularly Mott behavior, remains poorly understood. Here, density functional theory calculation is utilized to investigate the electron-correlated properties of monolayer T-NbSe2 with various single selenium/niobium vacancies. It is found that a single vacancy can induce geometric alterations over several nanometers, distinguished from typical 2D materials. A unique selenium vacancy site can precisely eliminate Mott electrons of T-NbSe2 and gradually lead the transitions from a ferromagnetic charge transfer insulator into a non-magnetic band insulator. Moreover, writing in and erasing Mott electrons can be flexibly manipulated by substituting the selenium site with arsenic, bromine, and potassium elements. The modulation mechanism by selenium vacancy originates from a synergistic combination of compressive strain and electron doping. The results systematically reveal that defect engineering is an ingenious strategy for atomically manipulating electron-correlated properties and manufacturing electronic patterns, enabling the control of Mott electrons in 2D materials.
Small MethodsMaterials Science-General Materials Science
CiteScore
17.40
自引率
1.60%
发文量
347
期刊介绍:
Small Methods is a multidisciplinary journal that publishes groundbreaking research on methods relevant to nano- and microscale research. It welcomes contributions from the fields of materials science, biomedical science, chemistry, and physics, showcasing the latest advancements in experimental techniques.
With a notable 2022 Impact Factor of 12.4 (Journal Citation Reports, Clarivate Analytics, 2023), Small Methods is recognized for its significant impact on the scientific community.
The online ISSN for Small Methods is 2366-9608.