{"title":"A deep trench-type SiC MOSFET integrated with Schottky diode for enhanced oxide reliability and switching performances","authors":"Liang Tian, Qingchun Zhang","doi":"10.1016/j.mejo.2025.106639","DOIUrl":null,"url":null,"abstract":"<div><div>This paper presents a novel deep trench-type SiC MOSFET integrated with Schottky diodes (DT-JMOS) designed to improve oxide reliability and switching performances. In contrast to conventional SiC trench MOSFET with Schottky diodes (CT-JMOS), the DT-JMOS utilizes a narrower JFET region and a P-bot structure, resulting in superior electric field reductions in gate oxide layer to improve reliability. The unique structure also enables double-channel operation and deeper embedded Schottky contacts, significantly enhancing the current conduction capabilities in both the first and third quadrants. Furthermore, simulation results indicate that the DT-JMOS achieves a 97.6 % decrease in gate-to-drain capacitance (<em>C</em><sub>gd</sub>), leading to a 67.5 % improvement in gate-to-drain charge (<em>Q</em><sub>gd</sub>), and eventually resulting in reductions by factors of 3.2 and 3.5 for figure of merit <em>Q</em><sub>gd</sub> × <em>R</em><sub>on,sp</sub> and total switching losses (<em>E</em><sub>total</sub>), respectively. These attributes suggest that the DT-JMOS is more suitable for high-voltage and high-frequency applications.</div></div>","PeriodicalId":49818,"journal":{"name":"Microelectronics Journal","volume":"159 ","pages":"Article 106639"},"PeriodicalIF":1.9000,"publicationDate":"2025-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microelectronics Journal","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1879239125000888","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
This paper presents a novel deep trench-type SiC MOSFET integrated with Schottky diodes (DT-JMOS) designed to improve oxide reliability and switching performances. In contrast to conventional SiC trench MOSFET with Schottky diodes (CT-JMOS), the DT-JMOS utilizes a narrower JFET region and a P-bot structure, resulting in superior electric field reductions in gate oxide layer to improve reliability. The unique structure also enables double-channel operation and deeper embedded Schottky contacts, significantly enhancing the current conduction capabilities in both the first and third quadrants. Furthermore, simulation results indicate that the DT-JMOS achieves a 97.6 % decrease in gate-to-drain capacitance (Cgd), leading to a 67.5 % improvement in gate-to-drain charge (Qgd), and eventually resulting in reductions by factors of 3.2 and 3.5 for figure of merit Qgd × Ron,sp and total switching losses (Etotal), respectively. These attributes suggest that the DT-JMOS is more suitable for high-voltage and high-frequency applications.
期刊介绍:
Published since 1969, the Microelectronics Journal is an international forum for the dissemination of research and applications of microelectronic systems, circuits, and emerging technologies. Papers published in the Microelectronics Journal have undergone peer review to ensure originality, relevance, and timeliness. The journal thus provides a worldwide, regular, and comprehensive update on microelectronic circuits and systems.
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