This paper presents a comprehensive electrical modeling framework for shield differential multibit - through glass via (DM-TGV) structure envisioned for three-dimensional (3D) integrated circuits. Closed-form mathematical expressions for the via resistance, inductance, capacitance, and conductance are formulated directly from its geometric attributes. The effective complex conductivity of carbon nanotube (CNT) is extracted with frequency at various diameter of CNT. The exponential matrix - rational approximation (EM-RA) technique is employed to investigate its high-frequency performance, enabling the extraction of frequency-dependent parameters such as the magnitude of S21 under differential and common-mode excitation for different filler materials and via heights across a wide spectral range. The analytical results are corroborated through full-wave simulations using the high frequency structure simulator (HFSS). Transient-domain behavior of the shield DM-TGV is further examined by incorporating variations in temperature, and surface roughness with their values spanning 300–500K and 150–1500 nm, respectively. Transfer characteristics are evaluated for multiple filler configurations and via dimensions, and the results obtained are compared with both conventional multibit differential TGVs and coaxial through-silicon vias (C-TSVs). It has been observed that the proposed shield DM-TGV provides substantially improved bandwidth relative to C-TSVs. In addition, Nyquist stability validation using EM-RA is carried out for different material fillings and via heights. The shield DM-TGV demonstrates superior stability when benchmarked against C-TSVs and conventional DM-TGVs, establishing it as a more reliable alternative for high-frequency 3D on-chip interconnects.
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