Solution-Processed Metal-Oxide Nanoparticles to Prevent The Sputtering Damage in Perovskite/Silicon Tandem Solar Cells

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-03-10 DOI:10.1021/acsami.5c00090
Erica Magliano, Francesco Di Giacomo, Harshavardhan Reddy Sathy, Shirin M. Pourmotlagh, Gemma Giliberti, David Becerril Rodriguez, Giuseppe Ammirati, Paolo Mariani, Francesca Zarotti, Fabio Matteocci, Marco Luce, Iurie Usatii, Eugenia Bobeico, Marco Della Noce, Antonio Cricenti, Federica Cappelluti, Lucia V. Mercaldo, Paola Delli Veneri, Aldo Di Carlo
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Abstract

Semitransparent perovskite solar cells (ST-PSCs) for tandem applications typically use a buffer layer deposited via atomic layer deposition (ALD) to protect the cell stack from the damage induced by the sputtering of the transparent electrode. Here, we present a simple yet effective solution-processed buffer layer based on metal-oxide nanoparticles to mitigate sputter-induced damage. We exploit this strategy in a monolithic tandem integrating the optimized ST-PSC on a polished front-side/unpolished rear-side p-type silicon heterojunction (SHJ) solar cell. The intrinsic roughness on the backside significantly boosts the absorption, thus suppressing the need for a dedicated texturization step and leading to a final maximum efficiency of 25.3%. Our findings highlight the potential of solution-processed buffer layers as a practical and scalable solution to mitigate the sputtering damage, as well as the potential of silicon wafers with an unpolished rear surface for enhanced photocurrent.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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