Visualizing Molybdenum Pentachloride Flow During Vapor Deposition Processes Using Absorption Imaging.

IF 2.2 3区 化学 Q2 INSTRUMENTS & INSTRUMENTATION Applied Spectroscopy Pub Date : 2025-03-13 DOI:10.1177/00037028251325565
James E Maslar, Berc Kalanyan
{"title":"Visualizing Molybdenum Pentachloride Flow During Vapor Deposition Processes Using Absorption Imaging.","authors":"James E Maslar, Berc Kalanyan","doi":"10.1177/00037028251325565","DOIUrl":null,"url":null,"abstract":"<p><p>An absorption imaging technique was described for visualizing molybdenum pentachloride (MoCl<sub>5</sub>) flow during an atomic layer deposition/pulsed chemical vapor deposition process. The imaging system was composed of a telecentric lens and a commercial 7.1 megapixels (MP) complementary metal oxide semiconductor (CMOS) camera. The light source was a fiber-coupled light emitting diode operating at a peak emission wavelength of 443  nm. Flow images of MoCl<sub>5</sub> vapor entrained in a carrier gas were recorded at approximately 93 frames per second in a research-grade vapor deposition chamber. The utility of this technique was illustrated by comparing the MoCl<sub>5</sub> flow patterns for two precursor injection conditions, conditions consisting of different argon carrier gas flow rate and chamber pressure. For a low flow rate and chamber pressure, the flow images showed a gradual expansion of the MoCl<sub>5</sub> concentration front through the field of view with a relatively short MoCl<sub>5</sub> residence time. These flow patterns result in a relatively uniform precursor concentration front impinging on the wafer surface with the precursor being efficiently exhausted from the chamber, making these conditions desirable for thin film deposition in this chamber. For a high carrier gas flow rate and elevated chamber pressure, the flow images showed a high gas velocity jet impinging on the wafer chuck surface and the formation of gas recirculation zones, resulting in a relatively long residence time. These flow conditions would make it difficult to reproducibly deposit uniform thin films in this chamber. This comparison demonstrated the utility of this technique for qualitative characterization of precursor flow fields with minimal data processing. However, the two-dimensional data obtained from this technique can also provide the basis for training and validating computational fluid dynamics models. Furthermore, the addition of duplicate optical systems would provide the basis for determining the three-dimensional precursor distribution through tomographic analysis.</p>","PeriodicalId":8253,"journal":{"name":"Applied Spectroscopy","volume":" ","pages":"37028251325565"},"PeriodicalIF":2.2000,"publicationDate":"2025-03-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Spectroscopy","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.1177/00037028251325565","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"INSTRUMENTS & INSTRUMENTATION","Score":null,"Total":0}
引用次数: 0

Abstract

An absorption imaging technique was described for visualizing molybdenum pentachloride (MoCl5) flow during an atomic layer deposition/pulsed chemical vapor deposition process. The imaging system was composed of a telecentric lens and a commercial 7.1 megapixels (MP) complementary metal oxide semiconductor (CMOS) camera. The light source was a fiber-coupled light emitting diode operating at a peak emission wavelength of 443  nm. Flow images of MoCl5 vapor entrained in a carrier gas were recorded at approximately 93 frames per second in a research-grade vapor deposition chamber. The utility of this technique was illustrated by comparing the MoCl5 flow patterns for two precursor injection conditions, conditions consisting of different argon carrier gas flow rate and chamber pressure. For a low flow rate and chamber pressure, the flow images showed a gradual expansion of the MoCl5 concentration front through the field of view with a relatively short MoCl5 residence time. These flow patterns result in a relatively uniform precursor concentration front impinging on the wafer surface with the precursor being efficiently exhausted from the chamber, making these conditions desirable for thin film deposition in this chamber. For a high carrier gas flow rate and elevated chamber pressure, the flow images showed a high gas velocity jet impinging on the wafer chuck surface and the formation of gas recirculation zones, resulting in a relatively long residence time. These flow conditions would make it difficult to reproducibly deposit uniform thin films in this chamber. This comparison demonstrated the utility of this technique for qualitative characterization of precursor flow fields with minimal data processing. However, the two-dimensional data obtained from this technique can also provide the basis for training and validating computational fluid dynamics models. Furthermore, the addition of duplicate optical systems would provide the basis for determining the three-dimensional precursor distribution through tomographic analysis.

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
介绍了一种吸收成像技术,用于在原子层沉积/脉冲化学气相沉积过程中观察五氯化钼(MoCl5)的流动。成像系统由一个远心镜头和一个 710 万像素(MP)商用互补金属氧化物半导体(CMOS)相机组成。光源为光纤耦合发光二极管,峰值发射波长为 443 nm。在研究级气相沉积室中,以每秒约 93 帧的速度记录了载气中夹带的 MoCl5 蒸汽的流动图像。通过比较两种前驱体注入条件(包括不同的氩载气流速和腔室压力)下的 MoCl5 流动模式,说明了该技术的实用性。在流速和腔室压力较低的情况下,流动图像显示,MoCl5 浓度前沿在视野中逐渐扩大,MoCl5 的停留时间相对较短。这些流动模式导致相对均匀的前驱体浓度前沿撞击晶片表面,前驱体被有效地排出腔室,使这些条件成为在此腔室中进行薄膜沉积的理想条件。在载气流速较高和腔室压力较高的情况下,流动图像显示有高速气体射流冲击晶片夹头表面,并形成气体再循环区,导致停留时间相对较长。在这种流动条件下,很难在该腔室中重复沉积均匀的薄膜。这一对比证明了该技术的实用性,只需进行最少的数据处理,即可对前驱体流场进行定性表征。不过,从这项技术中获得的二维数据也可作为训练和验证计算流体动力学模型的基础。此外,增加重复光学系统将为通过层析分析确定前体的三维分布提供基础。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Applied Spectroscopy
Applied Spectroscopy 工程技术-光谱学
CiteScore
6.60
自引率
5.70%
发文量
139
审稿时长
3.5 months
期刊介绍: Applied Spectroscopy is one of the world''s leading spectroscopy journals, publishing high-quality peer-reviewed articles, both fundamental and applied, covering all aspects of spectroscopy. Established in 1951, the journal is owned by the Society for Applied Spectroscopy and is published monthly. The journal is dedicated to fulfilling the mission of the Society to “…advance and disseminate knowledge and information concerning the art and science of spectroscopy and other allied sciences.”
期刊最新文献
Analysis of the Fossilization Processes of Vicarya callosa japonica Shells Using Raman Micro-Mapping Combined with Principal Component Analysis and Partial Least Squares Regression. Confocal Raman Microscopy as a Probe of Material Deconstruction in Processed Low-Density Polyethylene Particles. Prominent Composition-Dependent Dynamics Decoupling in the Choline Chloride-Glycerol Deep Eutectic Solvent System. Real-Time Mapping of Polymer Film Thickness Using Near-Infrared Hyperspectral Imaging. Visualizing Molybdenum Pentachloride Flow During Vapor Deposition Processes Using Absorption Imaging.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1