{"title":"Enhanced tunnel electroresistance in BAs/In2S3 ferroelectric tunnel junction through ferroelectric control of band alignments","authors":"Ruixue Li , Sicong Zhu , Jun Ding","doi":"10.1016/j.commatsci.2025.113823","DOIUrl":null,"url":null,"abstract":"<div><div>We have designed two-dimensional ferroelectric tunnel junctions (FTJs) utilizing BAs/In<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>S<span><math><msub><mrow></mrow><mrow><mn>3</mn></mrow></msub></math></span> van der Waals heterostructures and explored their transport characteristics. At low bias voltage, a pronounced difference in current magnitudes under different polarization states is observed, leading to a giant tunneling electroresistance (TER) ratio of <span><math><mrow><mn>1</mn><msup><mrow><mn>0</mn></mrow><mrow><mn>8</mn></mrow></msup><mtext>%</mtext></mrow></math></span>. Analysis of the projected band structures reveals changes in band alignment from type-III to type-I under the ferroelectric polarization reversal. Further discussions indicate that polarization reversal can cause a variation in the total charge transfer, consequently altering the Fermi level’s position in the BAs and In<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>S<span><math><msub><mrow></mrow><mrow><mn>3</mn></mrow></msub></math></span> layers. This alteration results in a transition between metallic and semiconducting states, thus achieving a high TER ratio. These findings imply great potential of high-performance 2D FTJs, which may contribute to the development of non-volatile storage devices and ferroelectric field-effect transistors.</div></div>","PeriodicalId":10650,"journal":{"name":"Computational Materials Science","volume":"253 ","pages":"Article 113823"},"PeriodicalIF":3.1000,"publicationDate":"2025-03-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Computational Materials Science","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0927025625001661","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
We have designed two-dimensional ferroelectric tunnel junctions (FTJs) utilizing BAs/InS van der Waals heterostructures and explored their transport characteristics. At low bias voltage, a pronounced difference in current magnitudes under different polarization states is observed, leading to a giant tunneling electroresistance (TER) ratio of . Analysis of the projected band structures reveals changes in band alignment from type-III to type-I under the ferroelectric polarization reversal. Further discussions indicate that polarization reversal can cause a variation in the total charge transfer, consequently altering the Fermi level’s position in the BAs and InS layers. This alteration results in a transition between metallic and semiconducting states, thus achieving a high TER ratio. These findings imply great potential of high-performance 2D FTJs, which may contribute to the development of non-volatile storage devices and ferroelectric field-effect transistors.
期刊介绍:
The goal of Computational Materials Science is to report on results that provide new or unique insights into, or significantly expand our understanding of, the properties of materials or phenomena associated with their design, synthesis, processing, characterization, and utilization. To be relevant to the journal, the results should be applied or applicable to specific material systems that are discussed within the submission.