Magnetic response of monolayer H-phase VS2 nanosheets at room temperature: Implications for spintronics device

IF 5.5 3区 工程技术 Q1 ENGINEERING, CHEMICAL Journal of the Taiwan Institute of Chemical Engineers Pub Date : 2025-03-19 DOI:10.1016/j.jtice.2025.106073
Amit Kumar Patel, Suyash Rai, Sajal Rai
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Abstract

Background

Transition metal dichalcogenides (TMDs), explicitly monolayer vanadium disulfide (VS2) in its H-phase, have gained remarkable attention due to their semiconducting nature, intrinsic magnetic properties at room temperature (RT), and potential use in future spintronic devices.

Method

In this study, we report an optimized, simple, and scalable synthesis of monolayer H-phase VS2 crystal using an atmospheric pressure chemical vapor deposition (APCVD) technique.

Significant findings

The Raman spectra and High-resolution transmission electron microscopy (HRTEM) image of the as-synthesized VS2 crystal reveal that the as-synthesized sample has an H-phase, and atomic force microscopy (AFM) confirms the presence of a monolayer with a step height of ∼ 0.7 nm. Further, the room temperature magnetic force microscopy (MFM) study gives a phase shift of 0.68° to 0.06° for the sample-tip variation from 20 nm to 140 nm in steps of 20 nm, suggesting an intrinsic long-range magnetic ordering in the as-synthesized VS2 crystal. The decrease in the MFM phase shift exhibits exponential dependence on the sample to AFM tip distance. Finally, our MFM phase shift measurement findings suggest a RT magnetic response in monolayer H-phase VS2 crystal. These results are much higher than the other previously reported MFM responses of metallic T-phase VS2, indicating robust experimental evidence for the magnetic behavior of monolayer H-phase VS2. Our study introduces a pathway to explore the opportunity for highly efficient future spintronic devices using 2D magnetic materials at RT.

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背景过渡金属二掺杂物(TMDs),特别是H相单层二硫化钒(VS2),因其半导体性质、室温(RT)下的内在磁性以及在未来自旋电子器件中的潜在用途而备受关注。方法在本研究中,我们报告了利用常压化学气相沉积(APCVD)技术优化、简单和可扩展地合成单层H相VS2晶体的方法。重要发现合成的 VS2 晶体的拉曼光谱和高分辨率透射电子显微镜(HRTEM)图像显示,合成的样品具有 H 相,原子力显微镜(AFM)证实存在阶跃高度为 ∼ 0.7 nm 的单层。此外,室温磁力显微镜(MFM)研究显示,样品尖端从 20 nm 到 140 nm 以 20 nm 为步长的变化范围内,相移为 0.68° 到 0.06°,这表明在合成的 VS2 晶体中存在固有的长程磁有序性。MFM 相移的减小与样品到 AFM 针尖的距离呈指数关系。最后,我们的 MFM 相移测量结果表明,单层 H 相 VS2 晶体具有 RT 磁响应。这些结果远远高于之前报道的其他金属 T 相 VS2 的 MFM 响应,为单层 H 相 VS2 的磁性行为提供了有力的实验证据。我们的研究为探索未来在 RT 条件下使用二维磁性材料制造高效自旋电子器件提供了一条途径。
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来源期刊
CiteScore
9.10
自引率
14.00%
发文量
362
审稿时长
35 days
期刊介绍: Journal of the Taiwan Institute of Chemical Engineers (formerly known as Journal of the Chinese Institute of Chemical Engineers) publishes original works, from fundamental principles to practical applications, in the broad field of chemical engineering with special focus on three aspects: Chemical and Biomolecular Science and Technology, Energy and Environmental Science and Technology, and Materials Science and Technology. Authors should choose for their manuscript an appropriate aspect section and a few related classifications when submitting to the journal online.
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