Thermal annealing-induced phase transition and optical property modulation of InxSe80−xTe20 thin film

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-03-21 DOI:10.1007/s10854-025-14588-3
Pandian Mannu, V. S. Manikandan, Karthikeyan Kandhasamy, Gokul Bangaru, Matheswaran Palanisamy, Arun Thirumurugan, Asokan Kandasami, Chi-Liang Chen, Chung-Li Dong
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Abstract

This study elucidates the impact of thermal annealing on the structural and optical properties of InxSe80−xTe20 thin films. The thermal treatment induces a remarkable amorphous-to-polycrystalline phase transition, characterized by the emergence of InSe and InSeTe phases. Differential Scanning Calorimetry (DSC) reveals critical glass transition and crystallization temperatures, providing insights into the thermodynamics of these chalcogenide systems. X-ray diffraction analyses confirm the amorphous nature of as-deposited films and their transformation to polycrystalline structures upon annealing. Microscopic investigations demonstrate significant surface modifications upon annealing treatment, further corroborating the crystallization behavior. Optical studies unveil annealing-dependent variations in absorption coefficient, extinction coefficient, and bandgap energy, which decrease as annealing temperature increases. This comprehensive investigation not only enhances our understanding of phase transitions in metal chalcogenides but also highlights the potential of these materials for emerging technologies, particularly in the field of phase change memory and optical data storage devices.

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InxSe80−xTe20薄膜的热退火诱导相变和光学性质调制
本研究阐明了热退火对InxSe80−xTe20薄膜结构和光学性能的影响。热处理引起了显著的非晶到多晶的相变,其特征是InSe和InSeTe相的出现。差示扫描量热法(DSC)揭示了关键的玻璃化转变和结晶温度,为这些硫族化物系统的热力学提供了见解。x射线衍射分析证实了沉积薄膜的无定形性质及其在退火后向多晶结构的转变。微观研究表明退火处理后显著的表面变化,进一步证实了结晶行为。光学研究揭示了吸收系数、消光系数和带隙能量随退火温度升高而减小的变化。这项全面的研究不仅增强了我们对金属硫族化合物相变的理解,而且突出了这些材料在新兴技术中的潜力,特别是在相变存储器和光数据存储设备领域。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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