Influence of potassium doping on the structural, optical, and optoelectrical properties of ZnS thin films for photovoltaic applications

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-03-24 DOI:10.1007/s10854-025-14605-5
Reim A. Almotiri
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Abstract

Zinc sulfide (ZnS) is an important n-type semiconductor exhibiting remarkable electrical and optical properties. The present study used the nebulizer spray pyrolysis technique to produce undoped and potassium-doped ZnS thin films using an economical spray pyrolysis method at different potassium concentrations (2.5, 5, and 7.5 wt%). The XRD results indicate a hexagonal structure for ZnS and potassium-doped ZnS thin films. Examining the structural characteristics reveals that the crystallite size (D) of the ZnS and potassium-doped ZnS films was expanded as the potassium content was elevated from 2.5 to 7.5 wt%. The strain and dislocation density of the examined potassium-doped ZnS layers were diminished by augmenting the potassium concentration in the ZnS films. The linear optical parameters of the examined potassium-doped ZnS films were estimated by recording the reflectance and transmittance spectra in the wavelength 200–2500 nm. The refractive index values of the potassium-doped ZnS layers were enhanced by raising the potassium concentration in the studied samples. Moreover, the energy gap (Eg) calculations refer to the ZnS and potassium-doped ZnS films having direct optical transition, and the Eg values were reduced from 3.64 to 2.97 eV by the increase in the potassium concentration. The Wemple and DiDomenico model study shows that the dispersion energy and oscillator strength of the examined potassium-doped ZnS layers were boosted by raising the potassium concentration while the oscillator energy was dropped. The optoelectrical indices analysis displays the enhancement of the plasma frequency, optical mobility, optical carrier concentration, electrical conductivity, and optical dielectric constants while enlarging the potassium concentration. Meanwhile, the boost in potassium contents enhances the nonlinear absorption coefficient and nonlinear refractive index of the ZnS and potassium-doped ZnS films. The hot probe procedure refers to these samples as n-type semiconductors. The results indicated that these samples could be used as a new window layer for solar cells.

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钾掺杂对光伏用ZnS薄膜结构、光学和光电性能的影响
硫化锌(ZnS)是一种重要的n型半导体,具有优异的电学和光学性能。本研究采用雾化器喷雾热解技术,在不同的钾浓度(2.5%、5%和7.5% wt%)下,采用经济的喷雾热解方法制备了未掺杂和掺钾的ZnS薄膜。XRD结果表明,ZnS和掺钾ZnS薄膜呈六边形结构。结构特征分析表明,当钾含量从2.5 wt%增加到7.5 wt%时,ZnS和掺钾ZnS薄膜的晶粒尺寸(D)增大。随着掺钾ZnS膜中钾浓度的增加,所检测的掺钾ZnS层的应变和位错密度减小。通过记录200 ~ 2500 nm波长的反射光谱和透射光谱,估计了所测掺钾ZnS薄膜的线性光学参数。随着样品中钾离子浓度的升高,掺钾ZnS层的折射率增强。此外,计算的能隙(Eg)是指具有直接光学跃迁的ZnS和掺钾的ZnS薄膜,随着钾浓度的增加,Eg值从3.64 eV降低到2.97 eV。Wemple和DiDomenico模型研究表明,钾离子浓度的提高提高了掺钾ZnS层的色散能和振子强度,同时降低了振子能量。光电指标分析表明,随着钾浓度的增加,等离子体频率、光迁移率、光载流子浓度、电导率和光介电常数都有所提高。同时,钾含量的增加提高了ZnS和掺钾ZnS薄膜的非线性吸收系数和非线性折射率。热探针程序将这些样品称为n型半导体。结果表明,这些样品可以作为太阳能电池的新窗口层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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