Pressureless Cu@Ag sintering process with formic acid reducing agent for improved bonding of power semiconductors

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-03-25 DOI:10.1007/s10854-025-14584-7
Myeonghyeon Jeon, Dajung Kim, Chulmin Oh
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Abstract

Ag and Cu are widely used sintering materials as alternatives to traditional soldering. In particular, Cu@Ag (Ag-coated Cu) has gained increasing attention as a cost-effective option. However, oxidation during the sintering of Cu@Ag and Cu DBC substrates can decrease joint strength and reliability. The addition of formic acid during the sintering process has been explored to mitigate oxidation and promote necking growth. In this study, pressureless sintering was performed using Cu@Ag to examine the effects of formic acid during the sintering process. Upon printing Cu@Ag paste on a Cu DBC substrate, an Si chip was placed on it, and sintering was performed at 300 °C in a nitrogen atmosphere. The process was tested under three conditions: introducing formic acid during pre-heating, introducing formic acid during sintering, and a control group without formic acid. The shear strength of the samples was measured post sintering. Scanning electron microscopy was used to analyze the microstructure of the sintered joints, including surface, cross-sections, and fracture surfaces after shearing. The shear strength of the sample in which formic acid was introduced during pre-heating was 1.3 times higher, measuring 21.54 MPa, compared to the condition without formic acid. This finding aligns with microstructural analysis, which showed enhanced necking formation between Cu@Ag particles. This study presents optimized pressureless sintering conditions for Cu@Ag paste, which is expected to be applicable to high-performance power module packages.

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使用甲酸还原剂的无压 Cu@Ag 烧结工艺可改善功率半导体的结合性能
银和铜是广泛使用的烧结材料,作为传统焊接的替代品。特别是,Cu@Ag (Ag-coated Cu)作为一种具有成本效益的选择而受到越来越多的关注。然而,Cu@Ag和Cu DBC衬底在烧结过程中的氧化会降低接头的强度和可靠性。研究了在烧结过程中添加甲酸以减轻氧化和促进颈缩生长。在本研究中,使用Cu@Ag进行无压烧结,以检查甲酸在烧结过程中的影响。在Cu DBC衬底上打印Cu@Ag浆料后,在其上放置硅片,并在300°C的氮气气氛中进行烧结。在预热时加入甲酸、烧结时加入甲酸和不加入甲酸的对照组三种条件下进行了工艺试验。在烧结后测定试样的抗剪强度。采用扫描电镜对剪切后烧结接头的表面、断面和断口组织进行了分析。在预热过程中加入甲酸的试样的抗剪强度为21.54 MPa,是未加入甲酸的试样的1.3倍。这一发现与微观结构分析相一致,微观结构分析显示Cu@Ag颗粒之间的颈缩形成增强。本研究优化了Cu@Ag浆料的无压烧结条件,有望应用于高性能功率模块封装。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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