Few-Layer WS2–WSe2 Lateral Heterostructures: Influence of the Gas Precursor Selenium/Tungsten Ratio on the Number of Layers

IF 15.8 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY ACS Nano Pub Date : 2021-12-20 DOI:10.1021/acsnano.1c08979
Di Wang, Zhengwei Zhang, Bolong Huang, Hongmei Zhang, Ziwei Huang, Miaomiao Liu, Xidong Duan*
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引用次数: 9

Abstract

Two-dimensional (2D) lateral heterostructures based on transition metal dichalcogenides (TMDCs) attract great interest due to their properties and potential applications in electronics and optoelectronics, such as p–n rectifying diodes, light-emitting diodes, photovoltaic devices, and bipolar junction transistors. However, the studies of 2D lateral heterostructures have mainly focused on monolayer nanosheets despite bilayer heterostructures exhibiting higher performance in many electronic and optoelectronic devices. It remains a great challenge to synthesize lateral heterostructures with few layers. Here, we report the growth of bilayer–bilayer (bl–bl), bilayer–bilayer–monolayer (bl–bl–mo), bilayer–monolayer (bl–mo), monolayer–bilayer (mo–bl), and monolayer–monolayer (mo–mo) tungsten disulfide (WS2) and tungsten diselenide (WSe2) lateral heterostructures. The selenium/tungsten (Se/W) ratio of WSe2 precursor powders and the growth atmosphere can be changed with the extension of annealing time, which influences the layer number of the heterostructures. More bilayer WSe2 epitaxially grows at the WS2 edge with short annealing time (high Se/W ratio), and more monolayer WSe2 grows at the WS2 edge with long annealing time (low Se/W ratio). The density functional theory (DFT) calculations provide an in-depth understanding of the growth mechanism. This report expands the 2D material lateral heterostructure family, which gives impetus to their applications in electronics and optoelectronics.

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少层WS2-WSe2横向异质结构:气体前驱体硒钨比对层数的影响
基于过渡金属二硫族化合物(TMDCs)的二维(2D)横向异质结构由于其特性和在电子和光电子领域的潜在应用而引起了人们的极大兴趣,如p-n整流二极管、发光二极管、光伏器件和双极结晶体管。然而,二维横向异质结构的研究主要集中在单层纳米片上,尽管双层异质结构在许多电子和光电子器件中表现出更高的性能。制备层数少的横向异质结构仍然是一个很大的挑战。在这里,我们报道了双层-双层(bl-bl)、双层-双层-单层(bl-bl - mo)、双层-单层(bl-mo)、单层-双层(mo-bl)和单层-单层(mo-mo)二硫化钨(WS2)和二硒化钨(WSe2)横向异质结构的生长。随着退火时间的延长,WSe2前驱体粉末的硒/钨(Se/W)比和生长气氛会发生变化,从而影响异质结构的层数。退火时间短(Se/W比高)的WS2边缘外延生长较多的双分子层WSe2,退火时间长(Se/W比低)的WS2边缘外延生长较多的单层WSe2。密度泛函理论(DFT)的计算提供了对生长机制的深入理解。该报告扩展了二维材料横向异质结构家族,推动了其在电子和光电子领域的应用。
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来源期刊
ACS Nano
ACS Nano 工程技术-材料科学:综合
CiteScore
26.00
自引率
4.10%
发文量
1627
审稿时长
1.7 months
期刊介绍: ACS Nano, published monthly, serves as an international forum for comprehensive articles on nanoscience and nanotechnology research at the intersections of chemistry, biology, materials science, physics, and engineering. The journal fosters communication among scientists in these communities, facilitating collaboration, new research opportunities, and advancements through discoveries. ACS Nano covers synthesis, assembly, characterization, theory, and simulation of nanostructures, nanobiotechnology, nanofabrication, methods and tools for nanoscience and nanotechnology, and self- and directed-assembly. Alongside original research articles, it offers thorough reviews, perspectives on cutting-edge research, and discussions envisioning the future of nanoscience and nanotechnology.
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