A novel method for characterization of Ultra Low Viscosity NCF layers using TCB for 3D Assembly

G. Capuz, M. Lofrano, C. Gerets, F. Duval, P. Bex, J. Derakhshandeh, K. Vanstreels, A. Phommahaxay, E. Beyne, Andy Miller
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Abstract

For die to wafer bonding of high-density interconnects and fine pitch microbumps developing and characterizing suitable underfill materials are required. In general, underfill serve to fill the spaces in-between microbumps for protection and reliability. Among the different types of underfill, Non-Conductive Film (NCF) has the advantages of fillet and volume control, and a built-in flux to aid wetting. However, challenges arise for thin dies and microbumps with fine pitches on film lamination, voiding, transparency, filler percentage, dicing compatibility and most importantly, deformation behavior and possibility to improve solder joint wetting. In a Die-to-Wafer D2W stacking with a Sn solder bump interconnect to Cu UBM, concern is high on the Cu pad oxidation due to the repeated TCB cycles that accelerate oxidation on neighboring dies. Process mitigation is needed to help reducing the oxidation. But even so, an NCF must have good embedded flux activation. Another main factor for an NCF to have efficient TCB process with good solder joint wetting, is the NCF deformation quality in which is a function of its viscosity. This parameter has direct impact on the deformation of solder bumps. High viscosity NCF would be difficult to deform, thus preventing solder contact to pad during TCB reflow temperature. High bond force is required and could lead to reduced alignment accuracy. Filler entrapment is also a subsequent concern for high filler loading, high viscosity NCF. For a low viscous NCF, careful attention in process characterization is needed in TCB with low bond force. Solder joint wetting is a problem with excessive squeeze-out due to fast and instantaneous deformation. With low viscosity, not only the bond force applied should be low, but the deformation behavior should also be understood to enable an effective NCF. We seek to demonstrate in this paper a creative methodology for Non-Conductive Film (NCF) material characterization, considering the factors of NCF viscosity, deformation, and solder squeeze-out. Characterizing NCF viscosity at fast TCB profiles is challenging considering deformation behavior of both the NCF itself and the solder bumps that shaped the solder squeeze-out and wetting. Furthermore, in this paper we use TCB tool position tracking to define the deformation curve of NCF film as a function of temperature and time at very fast profile of TCB. We use material viscosity curve as reference in relation to the actual deformation, and predict dynamic deformation based on Reynold’s equation within TCB profile duration. The experiments were performed with different heating ramp rates at target above Sn reflow of ~250C interface temperature. The deformation analysis is not limited to thin film sandwiched between parallel plates. Deformation test was performed on chips with and without microbumps and with rigid flat glass surface and its combinations. Deformation of underfill is recorded in the readout of TCB tool. As validation, we applied the optimized TCB process (force, temperature, and ramp rate) on a test vehicle with 20 and 40um pitch daisy chains and obtained close to 95% electrical yield with good joint and IMC formation. The cross-section SEM images show good wetting, revealing good activation of built-in flux when the optimized TCB profile was used.
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一种利用TCB三维组装表征超低粘度NCF层的新方法
对于高密度互连和细间距微凸块的芯片到晶片接合,需要开发和表征合适的底部填充材料。通常,底部填充物用于填充微凸块之间的空间,以实现保护和可靠性。在不同类型的底部填充物中,非导电膜(NCF)具有圆角和体积控制的优点,并内置助熔剂以帮助润湿。然而,对于在薄膜层压、空隙、透明度、填充物百分比、划片兼容性以及最重要的变形行为和改善焊点润湿的可能性上具有精细节距的薄管芯和微凸块来说,存在挑战。在具有Sn焊料凸块互连到Cu UBM的晶片到晶片D2W堆叠中,由于重复的TCB循环加速了相邻晶片上的氧化,因此对Cu焊盘氧化的关注度很高。需要过程缓解来帮助减少氧化。但即便如此,NCF也必须具有良好的嵌入通量激活。NCF具有具有良好焊点润湿性的有效TCB工艺的另一个主要因素是NCF变形质量,其中该变形质量是其粘度的函数。该参数对焊点的变形有直接影响。高粘度的NCF将难以变形,从而在TCB回流温度期间防止焊料接触到焊盘。需要高的结合力,并且可能导致对准精度降低。填料截留也是高填料负载、高粘度NCF的后续问题。对于低粘性NCF,在具有低结合力的TCB中,需要在工艺表征中仔细注意。焊点润湿是由于快速和瞬时变形而导致过度挤出的问题。在低粘度的情况下,不仅施加的结合力应该低,而且变形行为也应该被理解为能够实现有效的NCF。在本文中,我们试图证明一种创造性的非导电膜(NCF)材料表征方法,考虑了NCF粘度、变形和焊料挤出等因素。考虑到NCF本身和形成焊料挤出和润湿的焊料凸点的变形行为,在快速TCB轮廓下表征NCF粘度是具有挑战性的。此外,在本文中,我们使用TCB工具位置跟踪来定义NCF膜的变形曲线,该曲线是在TCB的非常快的轮廓下温度和时间的函数。我们使用材料粘度曲线作为与实际变形相关的参考,并基于雷诺方程预测TCB剖面持续时间内的动态变形。实验是在~250C界面温度的Sn回流靶上用不同的加热斜坡速率进行的。变形分析不限于夹在平行板之间的薄膜。在具有和不具有微凸块以及具有刚性平板玻璃表面及其组合的芯片上进行变形测试。底部填充物的变形记录在TCB工具的读数中。作为验证,我们在具有20和40um节距菊花链的测试车辆上应用了优化的TCB过程(力、温度和斜坡速率),并在良好的接头和IMC形成下获得了接近95%的电屈服。横截面SEM图像显示出良好的润湿性,显示出当使用优化的TCB轮廓时内置助熔剂的良好活化。
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来源期刊
Journal of Microelectronics and Electronic Packaging
Journal of Microelectronics and Electronic Packaging Engineering-Electrical and Electronic Engineering
CiteScore
1.30
自引率
0.00%
发文量
5
期刊介绍: The International Microelectronics And Packaging Society (IMAPS) is the largest society dedicated to the advancement and growth of microelectronics and electronics packaging technologies through professional education. The Society’s portfolio of technologies is disseminated through symposia, conferences, workshops, professional development courses and other efforts. IMAPS currently has more than 4,000 members in the United States and more than 4,000 international members around the world.
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