Effect of Pulsed Current Frequency and Anodisation Time on Surface Properties of Electropolished and Nonelectropolished Titanium Substrates

IF 1.5 Q4 ELECTROCHEMISTRY International Journal of Corrosion Pub Date : 2018-05-06 DOI:10.1155/2018/3204301
Victória da Costa Marba, N. N. Regone, E. N. Codaro, H. A. Acciari
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引用次数: 0

Abstract

Surface characteristics of anodic films formed on electropolished and nonelectropolished titanium substrates have been evaluated using different sets of anodisation parameters at room temperature. Surfaces were analysed by light microscopy, Raman spectroscopy, scanning electron microscopy, and X-ray diffraction. The formation of TiO2 anatase phase was only detected on nonelectropolished substrates and there seems to be a larger amount of anatase as samples are anodised; consequently, the smallest crystals were obtained at the highest frequency of pulsed current. EIS results showed that there is no difference in the degree of compactness along the layer thickness.
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脉冲电流频率和阳极氧化时间对电抛光和非电抛光钛基板表面性能的影响
在室温下,采用不同的阳极氧化参数,对电抛光和非电抛光钛基板上形成的阳极膜的表面特性进行了评价。通过光学显微镜、拉曼光谱、扫描电子显微镜和x射线衍射分析表面。TiO2锐钛矿相的形成仅在非电抛光的衬底上检测到,并且随着样品被阳极氧化,锐钛矿的数量似乎更多;因此,在脉冲电流的最高频率下获得最小的晶体。EIS结果表明,沿层厚方向致密程度无差异。
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来源期刊
CiteScore
5.70
自引率
0.00%
发文量
8
审稿时长
14 weeks
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