Development and Research of the System for Control of Parameters of Manufacture of Halva Technological Process

I. Hrihorenko, S. Hrihorenko, I. Nosova
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Abstract

The paper considers the solution of the scienti­fic and practical problem of improving the system of control of the parameters of the technological process of halva production from the creation of the structu­ral scheme to the development of the electrical circuit diagram. The results of direct multiple measurements obtained from the control system, namely the humi­dity and temperature sensor (SHT21), have been pro­cessed. The equations of direct and inverse regression were constructed and the nature of the relationship between temperature and humidity was established using the pair correlation coefficients. The developed control system makes it possible to provide a relative measurement error of not less than 2,5 %. Control systems are proposed for use at halva plants with the duty to control the basic parameters of the process to ensure the production of quality products. The measuring device includes the follo­wing primary measuring transducers: raw material moisture sensor (FIZEPR-SW100.11.x), air humi­dity sensor (SHT21), water temperature sensor, ca­ramel mass, halves during mixing (DS18B20 Dallas Semiconductor model), temperature control sensor halva storage air (ADT7420). ATmega16 was used as the microcontroller. The proposed meter is capable of transmitting data up to 50 m over a 2,4 GHz radio channel with a SPI interface to the microcontroller. This transmission enables the nRF24L01 radio to operate at 2,4 GHz (Wi-Fi frequency). The need to improve the existing meter has been proved by the use of a radio channel due to the fact that at this time it is necessary to avoid using wired interfaces where possible, due to the inability, sometimes, to draw communication lines due to the pre­sence of already installed equipment.
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Halva工艺过程参数控制系统的开发与研究
本文从结构方案的编制到电路图的编制,探讨了改进半真空生产工艺过程参数控制系统的科学性和实用性问题。对控制系统温湿度传感器(SHT21)的直接多次测量结果进行了处理。利用对相关系数建立了温度与湿度的正、逆回归方程,并确定了温度与湿度关系的性质。所开发的控制系统可以提供不小于2.5%的相对测量误差。提出了用于半真空工厂的控制系统,其任务是控制过程的基本参数,以确保生产优质产品。测量装置包括以下主要测量传感器:原料湿度传感器(FIZEPR-SW100.11.x),空气湿度传感器(SHT21),水温传感器,ca-ramel质量,混合过程中的一半(DS18B20达拉斯半导体型号),温度控制传感器半存储空气(ADT7420)。采用ATmega16作为微控制器。所提出的仪表能够通过2.4 GHz无线电信道传输数据高达50米,并具有SPI接口到微控制器。这种传输使nRF24L01无线电能够在2.4 GHz (Wi-Fi频率)下工作。改进现有仪表的需要已通过使用无线电信道得到证明,因为此时有必要避免在可能的情况下使用有线接口,因为由于已经安装的设备的存在,有时无法绘制通信线路。
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