Research on Maskless Lithography System Based on Digital Oblique Scanning Strategy

Abstract

In this paper, based on the scanning lithography imaging principle of digital micromirror devices (DMD), an oblique scanning lithography strategy was proposed, and successfully used in the maskless lithography system. During the design and construction of the system, ZEMAX optical lighting system design, non-sequential simulation optimization analysis, pulse width modulation and other methods were adopted comprehensively which can effectively improve the lithography quality. The experimental results showed that this lithography system can successfully fabricate large-area linear grating pattern with a resolution of 0.8 μm, which can effectively make up for the quantization error and other defects existing in the current maskless lithography system, and will have a broad application prospect in fabricating large-area, high-precision micro-nano structures.