Recent Advances in Atmospheric Vapor-Phase Deposition of Transparent and Conductive Zinc Oxide†

Abstract

The industrial need for high-throughput and low-cost ZnO deposition processes has triggered the development of atmospheric vapor-phase deposition techniques which can be easily applied to continuous, in-line manufacturing. While atmospheric CVD is a mature technology, new processes for the growth of transparent conductive oxides on thermally sensitive materials or flexible substrates are being developed, such as atmospheric plasma-enhanced (PE)-CVD and atmospheric spatial atomic layer deposition (ALD). In this article, the challenges and recent results on the growth of ZnO under atmospheric pressure by CVD, PE-CVD, and spatial ALD are reviewed and the use of these films as transparent electrodes in thin film solar cells are presented.