Mariusz Zdrojek, Jan Sobieski, Anna Duzynska, Ewa Zbydniewska, Wlodek Strupinski, Jacek Ratajczak, Jarosław Judek
{"title":"Synthesis of Carbon Nanotubes from Propane","authors":"Mariusz Zdrojek, Jan Sobieski, Anna Duzynska, Ewa Zbydniewska, Wlodek Strupinski, Jacek Ratajczak, Jarosław Judek","doi":"10.1002/cvde.201404329","DOIUrl":null,"url":null,"abstract":"<p>Growth of high quality CNTs using pure propane is demonstrated over a range of growth temperatures (600–1100 °C). SWCNT and MWCNT volumes in the grown material can by tuned using the growth temperature. The SEM image shows CNTs grown at 900 °C with both SWCNTs and MWCNTs visible. Increasing temperature yields higher depositions of disordered carbon material besides NTs.\n\n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 4-5-6","pages":"94-98"},"PeriodicalIF":0.0000,"publicationDate":"2015-04-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201404329","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chemical Vapor Deposition","FirstCategoryId":"1085","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/cvde.201404329","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8
Abstract
Growth of high quality CNTs using pure propane is demonstrated over a range of growth temperatures (600–1100 °C). SWCNT and MWCNT volumes in the grown material can by tuned using the growth temperature. The SEM image shows CNTs grown at 900 °C with both SWCNTs and MWCNTs visible. Increasing temperature yields higher depositions of disordered carbon material besides NTs.
期刊介绍：
Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
