{"title":"AACVD of Molybdenum Sulfide and Oxide Thin Films From Molybdenum(V)-based Single-source Precursors**","authors":"Nicky Savjani, Jack R. Brent, Paul O'Brien","doi":"10.1002/cvde.201407135","DOIUrl":null,"url":null,"abstract":"<div>\n \n <section>\n \n <p>The decomposition of Mo<sub>2</sub>O<sub>3</sub>(S<sub>2</sub>CNEt<sub>2</sub>) <sub>4</sub> (<b>1</b>) and Mo<sub>2</sub>O<sub>3</sub>(S<sub>2</sub>COEt)<sub>4</sub> (<b>2</b>) single-source precursors (SSPs) via aerosol-assisted (AA<sup>−</sup>) CVD onto glass substrates is reported. The films grown from <b>2</b> are achieved at a lower temperature than <b>1</b> (300 and 425 °C, respectively), potentially attributable to the Chugaev elimination mechanism. Raman spectroscopy (RS) and scanning electron microscopy (SEM) show the composition of the films to be variable; films that are grown from the AACVD reaction of <b>1</b> are found to be of pure MoS<sub>2</sub> nanoplates, whereas those grown from <b>2</b> consist of MoO<sub>3</sub> microparticles and MoO<sub>2</sub> noncrystalline films, together with various nanostructures of MoS<sub>2</sub>, depending on deposition temperature. The decomposition processes of the SSPs are assessed to determine why these variations in thin films are seen.</p>\n </section>\n </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 1-2-3","pages":"71-77"},"PeriodicalIF":0.0000,"publicationDate":"2015-01-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201407135","citationCount":"21","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chemical Vapor Deposition","FirstCategoryId":"1085","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/cvde.201407135","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 21
Abstract
The decomposition of Mo2O3(S2CNEt2) 4 (1) and Mo2O3(S2COEt)4 (2) single-source precursors (SSPs) via aerosol-assisted (AA−) CVD onto glass substrates is reported. The films grown from 2 are achieved at a lower temperature than 1 (300 and 425 °C, respectively), potentially attributable to the Chugaev elimination mechanism. Raman spectroscopy (RS) and scanning electron microscopy (SEM) show the composition of the films to be variable; films that are grown from the AACVD reaction of 1 are found to be of pure MoS2 nanoplates, whereas those grown from 2 consist of MoO3 microparticles and MoO2 noncrystalline films, together with various nanostructures of MoS2, depending on deposition temperature. The decomposition processes of the SSPs are assessed to determine why these variations in thin films are seen.
期刊介绍：
Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
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