Svetlana V. Belaya, Vladimir V. Bakovets, Igor P. Asanov, Ilya V. Korolkov, Veronika S. Sulyaeva
{"title":"MOCVD Synthesis of Terbium Oxide Films and their Optical Properties†","authors":"Svetlana V. Belaya, Vladimir V. Bakovets, Igor P. Asanov, Ilya V. Korolkov, Veronika S. Sulyaeva","doi":"10.1002/cvde.201507153","DOIUrl":null,"url":null,"abstract":"<div>\n \n <section>\n \n <p>Terbium oxide films are deposited on silicon substrates by metal-organic (MO)CVD from a vapor of Tb(thd)<sub>3</sub> in argon. Terbium sesquioxide (C-form) is realized in this process. Annealing of the films in air at 800 °C, followed by cooling in air, leads to the formation of Tb<sub>4</sub>O<sub>7</sub>. The Ar ion-etching of the annealed films causes a reduction of Tb<sup>4+</sup> to Tb<sup>3+</sup>. Optical <i>E<sub>g</sub></i> is estimated, photoluminescence spectra are investigated, and refractive indexes and dielectric constants are measured for terbium oxide films before and after annealing in air.</p>\n </section>\n </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 4-5-6","pages":"150-155"},"PeriodicalIF":0.0000,"publicationDate":"2015-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507153","citationCount":"17","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chemical Vapor Deposition","FirstCategoryId":"1085","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/cvde.201507153","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 17
Abstract
Terbium oxide films are deposited on silicon substrates by metal-organic (MO)CVD from a vapor of Tb(thd)3 in argon. Terbium sesquioxide (C-form) is realized in this process. Annealing of the films in air at 800 °C, followed by cooling in air, leads to the formation of Tb4O7. The Ar ion-etching of the annealed films causes a reduction of Tb4+ to Tb3+. Optical Eg is estimated, photoluminescence spectra are investigated, and refractive indexes and dielectric constants are measured for terbium oxide films before and after annealing in air.
期刊介绍：
Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
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