Plasma Enhanced Chemical Vapor Deposition of Poly(2,2,3,4,4,4-hexafluorobutyl acrylate) Thin Films†

Abstract

The synthesis of poly(2,2,3,4,4,4-hexafluorobutyl acrylate) (PHFBA) thin films using plasma enhanced chemical vapor deposition (PECVD) method is reported. PHFBA is a non-toxic and low surface energy polymer containing a –CF₃ end group, which makes PHFBA a suitable hydrophobic finish. The effects of plasma power and substrate temperature on chemical and morphological structure of as-deposited films are studied. A greater retention of the perfluoroalkyl functionality is found for the depositions carried out at low powers and high temperatures. PHFBA thin films show superhydrophobic properties when deposited on rough fiber mat surfaces with observed water contact angles greater than 150 degrees.