CVD Deposited Titania Thin Films for Gas Sensors with Improved Operating Characteristics

Marina V. Baryshnikova, Leonid A. Filatov, Andrey S. Petrov, Sergey E. Alexandrov
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引用次数: 18

Abstract

This paper describes the results of experimental evaluation of titanium dioxide thin films formed by CVD as active layers in semiconductor, resistive sensors for detection of ethanol vapors. TiO2 layers with a thickness of 90 nm are formed by CVD in the TTIP-O2-O3-Ar reaction system. Sensors manufactured with titania films formed under all the deposition conditions studied exhibit good electrical response to the ethanol vapors, with quick response-recovery characteristics in the temperature range 170–300 °C. Sensor performance is determined by the relative amount of anatase phase and grain size in the films. The response value (Rair/Rethanol) of the sample with the highest degree of crystallinity reached 37 at an operating temperature of 200 °C.

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气相沉积二氧化钛薄膜用于改善工作特性的气体传感器
本文介绍了用化学气相沉积法制备二氧化钛薄膜作为有源层的实验评价结果。在TTIP-O2-O3-Ar反应体系中,采用CVD法制备了厚度为90nm的TiO2层。在所研究的所有沉积条件下形成的二氧化钛薄膜制造的传感器对乙醇蒸汽表现出良好的电响应,在170-300°C的温度范围内具有快速的响应-恢复特性。传感器的性能取决于薄膜中锐钛矿相的相对数量和晶粒尺寸。在200℃的工作温度下,结晶度最高的样品的响应值(Rair/ re)达到37。
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Chemical Vapor Deposition
Chemical Vapor Deposition 工程技术-材料科学:膜
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期刊介绍: Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
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