Review on Synthetic Approaches toward the Synthesis of Clozapine, an Antipsychotic Drug

IF 3.1 3区 化学 Q2 CHEMISTRY, APPLIED Organic Process Research & Development Pub Date : 2023-08-23 DOI:10.1021/acs.oprd.3c00093
Siddhanath D. Bhosle, Shivanand V. Itage, Krishna A. Jadhav, Rajesh S. Bhosale* and Jhillu Singh Yadav*, 
{"title":"Review on Synthetic Approaches toward the Synthesis of Clozapine, an Antipsychotic Drug","authors":"Siddhanath D. Bhosle,&nbsp;Shivanand V. Itage,&nbsp;Krishna A. Jadhav,&nbsp;Rajesh S. Bhosale* and Jhillu Singh Yadav*,&nbsp;","doi":"10.1021/acs.oprd.3c00093","DOIUrl":null,"url":null,"abstract":"<p >A persistent and severe mental illness called Schizophrenia affects 20 million people globally. There is not a single component that causes Schizophrenia, according to research. Schizophrenia is hypothesized to result from genetic and environmental interactions, among other things. Antipsychotic medications, including Clozapine, Aripiprazole, Asenapine, Olanzapine, Quetiapine, Risperidone, and Cariprazine, are used to treat the majority of Schizophrenia cases. Clozapine is the first atypical antipsychotic and psychiatric medication (also called a second-generation antipsychotic, SGA). Clozapine was authorized in the US in December 2002 to lower the risk of suicide in individuals with Schizophrenia or schizoaffective disorder who were considered to be at chronic risk for suicidal behavior. It is mostly used to treat individuals with Schizophrenia and schizoaffective disorders who have not responded well to other antipsychotic medications or are unable to tolerate other medications because of extrapyramidal side effects. A brief background of recent developments in the synthesis of the Clozapine drug molecule is provided in this review.</p>","PeriodicalId":55,"journal":{"name":"Organic Process Research & Development","volume":"27 9","pages":"1546–1556"},"PeriodicalIF":3.1000,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Organic Process Research & Development","FirstCategoryId":"92","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acs.oprd.3c00093","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, APPLIED","Score":null,"Total":0}
引用次数: 0

Abstract

A persistent and severe mental illness called Schizophrenia affects 20 million people globally. There is not a single component that causes Schizophrenia, according to research. Schizophrenia is hypothesized to result from genetic and environmental interactions, among other things. Antipsychotic medications, including Clozapine, Aripiprazole, Asenapine, Olanzapine, Quetiapine, Risperidone, and Cariprazine, are used to treat the majority of Schizophrenia cases. Clozapine is the first atypical antipsychotic and psychiatric medication (also called a second-generation antipsychotic, SGA). Clozapine was authorized in the US in December 2002 to lower the risk of suicide in individuals with Schizophrenia or schizoaffective disorder who were considered to be at chronic risk for suicidal behavior. It is mostly used to treat individuals with Schizophrenia and schizoaffective disorders who have not responded well to other antipsychotic medications or are unable to tolerate other medications because of extrapyramidal side effects. A brief background of recent developments in the synthesis of the Clozapine drug molecule is provided in this review.

Abstract Image

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
抗精神病药物氯氮平的合成方法综述
一种名为精神分裂症的持续性严重精神疾病影响着全球2000万人。研究表明,导致精神分裂症的因素并不是单一的。据推测,精神分裂症是由遗传和环境相互作用以及其他因素造成的。抗精神病药物,包括氯氮平、阿立哌唑、阿塞那平、奥氮平、奎硫平、利培酮和卡里吡嗪,被用于治疗大多数精神分裂症病例。氯氮平是第一种非典型抗精神病和精神药物(也称为第二代抗精神病药物,SGA)。氯氮平于2002年12月在美国获得批准,用于降低精神分裂症或分裂情感性障碍患者的自杀风险,这些患者被认为有自杀行为的慢性风险。它主要用于治疗对其他抗精神病药物反应不佳或由于锥体外系副作用而无法耐受其他药物的精神分裂症和分裂情感性障碍患者。本文简要介绍了氯氮平药物分子合成的最新进展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
CiteScore
6.90
自引率
14.70%
发文量
251
审稿时长
2 months
期刊介绍: The journal Organic Process Research & Development serves as a communication tool between industrial chemists and chemists working in universities and research institutes. As such, it reports original work from the broad field of industrial process chemistry but also presents academic results that are relevant, or potentially relevant, to industrial applications. Process chemistry is the science that enables the safe, environmentally benign and ultimately economical manufacturing of organic compounds that are required in larger amounts to help address the needs of society. Consequently, the Journal encompasses every aspect of organic chemistry, including all aspects of catalysis, synthetic methodology development and synthetic strategy exploration, but also includes aspects from analytical and solid-state chemistry and chemical engineering, such as work-up tools,process safety, or flow-chemistry. The goal of development and optimization of chemical reactions and processes is their transfer to a larger scale; original work describing such studies and the actual implementation on scale is highly relevant to the journal. However, studies on new developments from either industry, research institutes or academia that have not yet been demonstrated on scale, but where an industrial utility can be expected and where the study has addressed important prerequisites for a scale-up and has given confidence into the reliability and practicality of the chemistry, also serve the mission of OPR&D as a communication tool between the different contributors to the field.
期刊最新文献
Issue Publication Information Issue Editorial Masthead Practical, Large-Scale Preparation of Ni(tmeda)(o-tol)Cl Practical and Efficient Approach to Scalable Synthesis of Rucaparib Chemical and Biochemical Approaches to an Enantiomerically Pure 3,4-Disubstituted Tetrahydrofuran Derivative at a Multikilogram Scale: The Power of KRED
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1