Photoluminescence spectra of polycrystalline ZnSe in different experimental geometries

IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC ACS Applied Electronic Materials Pub Date : 2020-01-01 DOI:10.3116/16091833/21/2/103/2020
I. Abbasov, M. Musayev, J. Huseynov, M. Kostyrko, S. Babayev, G. Eyyubov, S. Aliyeva
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引用次数: 4

Abstract

. We study the photoluminescence in polycrystalline ZnSe synthesized using a chemical vapour-deposition technique, which arises from excitation by the sources of different types and wavelengths. Two experimental geometries are used, which are related to the normal incidence of exciting radiation upon either polished or unpolished ZnSe surfaces. The excitation from the polished surface is carried out by the lasers with the wavelengths λ ex = 335 and 325 nm (i.e., the photon energies higher than the bandgap, hv ex > E g ), semiconductor lasers with λ ex = 532, 642 and 785 nm (i.e., hv ex < E g ) and a xenon lamp. The sample is also excited from the unpolished surface, using the lasers with λ ex = 325 nm ( hv ex > E g ) and λ ex = 532 nm ( hv ex < E g ), as well as the semiconductor laser with λ ex = 532 nm ( hv ex < E g ). Following from our experimental results, we analyze and compare the edge (exciton) luminescence and the impurity-defect luminescence. Different behaviours of the luminescence spectra are observed, which depend on the type of excitation. Instruments) grating 1800 and ANDOR IDUS CCD (DU420-OE respectively them spectral of our
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不同实验几何形状下多晶ZnSe的光致发光光谱
. 本文研究了化学气相沉积法合成的多晶ZnSe在不同类型和波长的光源激发下产生的光致发光。使用了两种实验几何形状,它们与激发辐射在抛光或未抛光的ZnSe表面上的正常入射有关。抛光表面的激发由波长λ ex = 335和325 nm的激光器(即光子能量高于带隙,hv ex = > E g)、λ ex = 532、642和785 nm的半导体激光器(即hv ex < E g)和氙灯进行。利用λ ex = 325 nm (hv ex = > E g)和λ ex = 532 nm (hv ex < E g)激光器以及λ ex = 532 nm (hv ex < E g)半导体激光器从未抛光表面激发样品。根据我们的实验结果,我们分析和比较了边缘(激子)发光和杂质缺陷发光。根据激发类型的不同,观察到不同的发光光谱行为。仪器:光栅1800和ANDOR IDUS CCD (DU420-OE)分别用于我们的光谱
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来源期刊
CiteScore
7.20
自引率
4.30%
发文量
567
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