Novel high PSRR high-order temperature-compensated subthreshold MOS bandgap reference

Zhou Qianneng , Zhu Ling , Li Hongjuan , Lin Jinzhao , Wang Liangcai , Luo Wei
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Abstract

Novel high power supply rejection ratio (PSRR) high-order temperature-compensated subthreshold metal-oxide-semiconductor (MOS) bandgap reference (BGR) is proposed in Semiconductor Manufacturing International Corporation (SMIC) 0.13 μm complementary MOS (CMOS) process. By adopting subthreshold MOS field-effect transistors (MOSFETs) and the piecewise-curvature temperature-compensated technique, the output reference voltage's temperature performance of the subthreshold MOS BGR is effectively improved. The subthreshold MOS BGR achieves high PSRR performance by adopting the technique of pre-regulator. Simulation results show that the temperature coefficient (TC) of the subthreshold MOS BGR is 1.38×10−6/°C when temperature is changed from −40 °C to 125 °C with a power supply voltage of 1.2 V. The subthreshold MOS BGR achieves the PSRR of −104.54 dB, −104.54 dB, −104.5 dB, −101.82 dB and −79.92 dB at 10 Hz, 100 Hz, 1 kHz, 10 kHz and 100 kHz respectively.

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新型高PSRR高阶温度补偿亚阈值MOS带隙基准
在半导体制造国际公司(SMIC)0.13μm互补MOS工艺中,提出了一种新型的高电源抑制比(PSRR)高阶温度补偿亚阈值金属氧化物半导体(MOS)带隙基准(BGR)。通过采用亚阈值MOS场效应晶体管和分段曲率温度补偿技术,有效地提高了亚阈值MOS BGR的输出参考电压温度性能。亚阈值MOS BGR采用预调节器技术,实现了较高的PSRR性能。仿真结果表明,在电源电压为1.2V的情况下,当温度从−40°C变为125°C时,亚阈值MOS BGR的温度系数(TC)为1.38×10−6/°C。在10 Hz、100 Hz、1 kHz、10 kHz和100 kHz时,亚阈MOS BGR分别实现了−104.54 dB、−104.54 dB、−104.5 dB、−101.82 dB和−79.92 dB的PSRR。
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