Nanofabrication based on MEMS

Abstract

In this paper, a novel nanofabrication method that developed from the traditional MEMS technology with anisotropic etching, deep reaction ion etching and sacrificial layer process has been presented. Nano needles, nano wires, nano beams even nano devices can be fabricated in a batch process. Beams with thickness of 12 nm, a nano tip with a heater on the beam, and a nano wire where width and thickness is only 50 nm are demonstrated. The scale effect of the Young's modulus of silicon has been observed and the nano-electronic-mechanical data storage has been achieved.