Han-Wool Yeon, Sung-Yup Jung, Jung-ryul Lim, J. Pyun, Hyungwook Kim, Dohyun Baek, Young‐Chang Joo
{"title":"Cu Contamination of the nMOSFET in a 3-D Integrated Circuit under Thermal and Electrical Stress","authors":"Han-Wool Yeon, Sung-Yup Jung, Jung-ryul Lim, J. Pyun, Hyungwook Kim, Dohyun Baek, Young‐Chang Joo","doi":"10.1149/2.018205ESL","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":11627,"journal":{"name":"Electrochemical and Solid State Letters","volume":"7 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2012-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrochemical and Solid State Letters","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1149/2.018205ESL","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
