Ion implanted monolithically integrated planar InP/InGaAs/InP:Fe photoreceiver

D. Rømer, H. Albrecht, L. Hoffmann, J. Walter, G. Ebbinghaus
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引用次数: 1

Abstract

The structure and fabrication of an integrated pin photodiode (PD) and junction field-effect transistor (JFET) are discussed. A 3-dB bandwidth of 5.8 GHz and an external quantum efficiency of 87% for the PD have been achieved using a selective n implantation to reduce the series resistance. The pinch off voltage and drain current of the JFET with a 1.5- mu m gate length have been adjusted with a selective p implantation beneath the channel layer.<>
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离子注入单片集成平面InP/InGaAs/InP:Fe光接收器
讨论了集成引脚光电二极管(PD)和结场效应晶体管(JFET)的结构和制作方法。采用选择性氮注入降低串联电阻,PD器件获得了5.8 GHz的3db带宽和87%的外量子效率。通过在沟道层下选择性p注入,可以调节栅极长度为1.5 μ m的JFET的掐断电压和漏极电流
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Effect of structural parameters on InGaAs/InAlAs 2DEG characteristics High speed InGaAs HBT devices and circuits High performance diffused InGaAs JFETs in OEICs Current-controlled liquid phase epitaxy of InAsP on InP substrates High power and high temperature operation of 1.5 mu m wavelength strained-layer InGaAs/InGaAsP SIPBH lasers
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