Ionization-Assisted Deposition of SrOx Thin Films for Electron Injection Layer of Organic Light Emitting Diodes

Kuniaki Tanaka, K. Maeda, H. Usui
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引用次数: 2

Abstract

Abstract SrOx thin films were prepared by the ionization-assisted deposition as the electron injection layer between the electron transport/emitting layer and the Al cathode of the organic light emitting diode. By inserting an SrOx layer of a few-nm thick, the luminance increased nearly three orders of magnitudes for the same driving voltage. The device performance was also controlled by the ion acceleration voltage that was applied in the course of SrOx film deposition. Compared to the simple evaporation, the ionization-assisted deposition improved the luminance and the power efficiency by more than two times. XPS analysis suggested that the ion acceleration leads to two dimensional homogeneous film growth at the initial stage of film deposition.
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有机发光二极管电子注入层用SrOx薄膜的电离辅助沉积
摘要:采用电离辅助沉积法制备了SrOx薄膜,作为有机发光二极管电子传输/发射层与Al阴极之间的电子注入层。在相同的驱动电压下,通过插入几nm厚的SrOx层,亮度提高了近3个数量级。SrOx薄膜沉积过程中所施加的离子加速电压对器件性能也有控制作用。与简单的蒸发相比,电离辅助沉积的亮度和功率效率提高了两倍以上。XPS分析表明,在膜沉积初期,离子加速导致了二维均匀膜的生长。
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